Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Andrew Estroff"'
Autor:
Andrew Estroff, Bruce W. Smith
Publikováno v:
International Journal of Optics, Vol 2012 (2012)
The unique properties of metamaterials, namely, their negative refractive index, permittivity, or permeability, have gained much recent attention. Research into these materials has led to the realization of a host of applications that may be useful t
Externí odkaz:
https://doaj.org/article/a858bdde82324930a386a7f9c9dc4155
Publikováno v:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 26:2192-2196
In recent years, the anomalous transmission of subwavelength apertures has become an emergent subject within the physical sciences. While the gain mechanism of these structures is still uncertain, the effect has been observed in several studies. Simi
Publikováno v:
SPIE Proceedings.
Line edge roughness (LER) is a common problem to most lithography approaches and is seen as the main resolution limiter for advanced technology nodes1. There are several contributors to LER such as chemical/optical shot noise, random nature of acid d
Publikováno v:
SPIE Proceedings.
The unique properties of metamaterials, namely their negative refractive index, permittivity, and permeability, have gained much recent attention. Research into these materials has led to the realization of a host of applications that may be useful t
Publikováno v:
SPIE Proceedings.
Double patterning has been proposed as a method to extend DUV lithography to 32nm and below. Here, a new form of double, or higher, multiple exposure technique is proposed. This new form of lithography uses a combination of Quantum State Control (QuS
Publikováno v:
SPIE Proceedings.
New applications of evanescent imaging for microlithography are introduced. The use of evanescent wave lithography (EWL) has been employed for 26nm resolution at 1.85NA using a 193nm ArF excimer laser wavelength to record images in a photoresist with
Publikováno v:
SPIE Proceedings.
Conventional site-base model calibration approaches have worked fine from the 180nm down to the 65nm technology nodes, but with the first 45nm technology nodes rapidly approaching, site-based model calibration techniques may not capture the details c
Publikováno v:
SPIE Proceedings.
With the advent of the first immersion and hyper-NA exposure tools, source polarization quality will become a hot topic. At these oblique incident angles, unintentional source polarization could result in the intensity loss of diffraction orders poss
Autor:
Travis Brist, George E. Bailey, Andrew Estroff, Andres Torres, Alexander N. Drozdov, Eric Hendrickx
Publikováno v:
SPIE Proceedings.
To perform a thorough source optimization during process development is becoming more critical as we move to leading edge-technology nodes. With each new node the acceptable process margin continues to shrink as a result of lowering k1 factors. This
Autor:
Andrew Estroff, Anatoly Bourov, Neal Lafferty, Lena Zavyalova, Yongfa Fan, Jianming Zhou, Bruce W. Smith
Publikováno v:
Optical Microlithography XVIII.
Interference imaging systems are being used more extensively for R&D applications where NA manipulation, polarization control, relative beam attenuation, and other parameters are explored and projection imaging approaches may not exist. To facilitate