Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Andrew E. Bair"'
Publikováno v:
SPIE Proceedings.
The effect of lens aberrations on the process windows of a 248 nm stepper is presented for multiple locations within the exposure field and for various illumination conditions. It is shown that the effect on the process window depends on the field lo
Autor:
Hiroshi Matsui, Jeffrey R. Johnson, Von Jerick T. Marcos, Audrey M. Davis, Andrew E. Bair, Charles R. Spinner, Steve Tanner, Bradley D. Lantz
Publikováno v:
SPIE Proceedings.
Preventing the formation of defects at the interface between an organic bottom-side anti-reflective coating and a photoresist is problematic with the use of these films. These defects have been attributed to different sources, such as mismatch of sur
Autor:
Charles R. Spinner, Jeffrey R. Johnson, Andrew E. Bair, Audrey M. Davis, Ralph R. Dammel, Peter D. Nunan, A Mark
Publikováno v:
SPIE Proceedings.
The effects of increasing bottom-side anti-reflective coating (BARC) thickness on the CD distribution within a device are presented. In conjunction with the increasing BARC thickness, reductions in the photoresist thickness are shown to be beneficial
Conference
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