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pro vyhledávání: '"Andrew Berwick"'
Publikováno v:
25th European Mask and Lithography Conference.
The evolution of the ALTA (R) series of laser mask pattern generators has increased the relative contribution of intensity errors on critical-dimension (CD) control to those from placement errors. This paradigm shift has driven a change in rasterizat
Autor:
Asher Klatchko, Samuel C. Howells, B. Skyborg, Michael E. Ungureit, Michael White, Thomas E. Chabreck, Robin Teitzel, Peter Pirogovsky, Cris Morgante, John Hubbard, Paul C. Allen, Andrew Berwick
Publikováno v:
SPIE Proceedings.
The ALTA 4300 system has been used to successfully write many advanced designs previously only possible with 50kV VSB systems. In order to further enlarge the application space of this high productivity system, an aerial image enhancement technique h