Zobrazeno 1 - 5
of 5
pro vyhledávání: '"Andrej Mironov"'
Autor:
Grigory Skoblin, Vladimir Miljkovic, Ankit Bisht, Srdjan Acimovic, Brian Bilenberg, Andrej Mironov, Jesper Fly, Niklas Hansson, T.H. Bro
Publikováno v:
Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) II.
To meet the demand for high quality augmented reality displays with larger field of view, large eye box and better image quality, large area diffraction gratings are needed. Across the industry different types of surface relief gratings for in-coupli
Autor:
Henrik Flyvbjerg, Maksim Zalkovskij, Anders Kristensen, Andrej Mironov, Marie Pødenphant, Kalim U. Mir, Kamila Koprowska, Jonas Nyvold Pedersen, Neil Ashley, Rodolphe Marie, Brian Bilenberg, Loïc Baerlocher, Celine Sabatel, Walter F. Bodmer
Publikováno v:
Marie, R, Pedersen, J N, Bærlocher, L, Koprowska, K, Pødenphant, M, Sabatel, C, Zalkovskij, M, Mironov, A, Bilenberg, B, Ashley, N, Flyvbjerg, H, Bodmer, W F, Kristensen, A & Mir, K U 2018, ' Single-molecule DNA-mapping and whole-genome sequencing of individual cells ', Proceedings of the National Academy of Sciences of the United States of America, vol. 115, no. 44, pp. 11192-11197 . https://doi.org/10.1073/pnas.1804194115
To elucidate cellular diversity and clonal evolution in tissues and tumors, one must resolve genomic heterogeneity in single cells. To this end, we have developed low-cost, mass-producible micro-/nanofluidic chips for DNA extraction from individual c
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d4bc4340ac3b54827845c1359afef95b
https://orbit.dtu.dk/en/publications/9ae9c25d-b5e1-4368-a4b7-39062cb7fb5c
https://orbit.dtu.dk/en/publications/9ae9c25d-b5e1-4368-a4b7-39062cb7fb5c
Autor:
Kristian Smistrup, Andrej Mironov, Stephen Rishton, Johan Eriksen, Ferdous Khan, T.H. Bro, Jesper Nørregaard, Anders Kristensen, Mark Emanuel, Anil Haraksingh Thilsted, Theodor Nielsen, Yin Zhang, Brian Bilenberg, Yong Ma, Ole Hansen
Publikováno v:
Microelectronic Engineering. 123:149-153
Display Omitted We replace e-beam patterning with nanoimprint lithography patterning.The nanoimprinted devices have equal quality as commercially available devices.The devices have 40mW output and more than 50dB side mode suppression ratio.Nanoimprin
Publikováno v:
Microelectronic Engineering. 84:1058-1061
We present combined electron beam and UV lithography (CEUL) in SU-8 as a fast and flexible lithographic technique for prototyping of functional polymer devices and pattern transfer applications. CEUL is a lithographic technique suitable for defining
Publikováno v:
Technical University of Denmark Orbit
We present a single mode, single polarization, distributed feedback polymer dye laser, based on a short high order Bragg grating defined in a dye doped polymer layer between two secondary polymer layers. The Bragg grating is defined solely with stand