Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Andreas Schmalen"'
Publikováno v:
Thin Solid Films. 575:25-29
A dual hot-wire arrangement has been designed and investigated for the deposition of various thin film materials by the hot-wire chemical vapor deposition (HWCVD) technique. Tantalum and rhenium wires were used for silicon and silicon carbide deposit
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::469114edf680636c09c6630b5aff8912
https://doi.org/10.1016/j.tsf.2014.10.028
https://doi.org/10.1016/j.tsf.2014.10.028
Autor:
Manuel Pomaska, Uwe Rau, Shenghao Li, Jan Hoß, Kaining Ding, Frank Pennartz, Maurice Nuys, Johannes Wolff, Andreas Schmalen, Friedhelm Finger, Jan Lossen, Ruijiang Hong
Publikováno v:
Applied physics letters 114(15), 153901 (2019). doi:10.1063/1.5089650
Hot-wire chemical vapor deposition (HWCVD) was utilized to develop a fast and high quality a-Si:H thin film fabrication method for poly-Si/SiOx carrier selective passivating contacts targeting at n-type passivated emitter rear totally diffused crysta
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fcdbf37a7935ac5befac97b53b4ff0eb
https://doi.org/10.1063/1.5089650
https://doi.org/10.1063/1.5089650
Publikováno v:
physica status solidi c. 7:754-757
Aluminum doped stoichiometric microcrystalline silicon carbide (µc-SiC:H) thin films deposited by Hot Wire Chemical Vapor Deposition (HWCVD) technique have been studied. Without Al-doping, highly crystalline µc-SiC:H thin films prepared from monome
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e5ad1b7a2f4bf7acb3bc4e0b735f27a2
https://doi.org/10.1002/pssc.200982769
https://doi.org/10.1002/pssc.200982769