Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Andrea M. Chacko"'
Autor:
Yichen Liang, Kelsey E. Brakensiek, Joyce Lowes, Andrea M. Chacko, Ruimeng Zhang, Veerle Van Driessche, Xiaolong Lang, Jaishankar Kasthuri, Ming Luo, Douglas J. Guerrero
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::233f3ac6832d7fce4b9df032b6b36420
https://doi.org/10.1117/12.2610985
https://doi.org/10.1117/12.2610985
Publikováno v:
Advances in Patterning Materials and Processes XXXVII.
Extreme ultraviolet (EUV) lithography has gained momentum towards high-volume manufacturing (HVM) as the method of choice for sub-20 nm half-pitch device fabrication. Optimized EUV photoresists and an improved understanding of the EUV patterning mech
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fd6f89bee5269b69568cc965fed88dbd
https://doi.org/10.1117/12.2551647
https://doi.org/10.1117/12.2551647