Zobrazeno 1 - 10
of 14
pro vyhledávání: '"Andre P. Weill"'
Autor:
Andre P. Weill, Sandrine Andre
Publikováno v:
Microelectronic Engineering. 30:99-102
The performances of advanced i-line steppers depend on numerous equipment parameters. For example, they are significantly affected by the change in numerical aperture and partial coherence, particularly when operating at the resolution limit. This pa
Publikováno v:
SPIE Proceedings.
The aim of this paper is to investigate the intrafield flare distribution and its link with the intrafield CD variation for various ASML lithographic tools. Flare is measured as the required dose to clear a 100micrometers -large positive resist patte
Publikováno v:
Advances in Resist Technology and Processing XI.
The resist processes used for optical lithography are mainly positive tone, based on the use of DNQ/novolac photoresists. It has been demonstrated that enhancing the resist pattern profiles is possible by optimization of the development step. Develop
Publikováno v:
Microelectronic Engineering. 6:427-431
This study examines the influence of the macromolecular characteristics on the PMMA spin coating both experimentally and from a phenomenological point of view. It is concluded that the weight average molecular weight of the spun on solution is a pert
Publikováno v:
SPIE Proceedings.
A two layers HPR/PMMA lithographic process is developped in order to overcome the limitations of the single layer scheme when over aluminium steps. Results of PMMA coating and step coverage, HPR patterning, descum of the interfacial layer, image deve
Publikováno v:
SPIE Proceedings.
Microwave energized bulbs are deep UV sources, which are well suited to applications requiring high light intensities of within the 200-260 nm wavelength range. This deep UV source has to date only been used either for transferring the photoresist pa
Publikováno v:
SPIE Proceedings.
In the years to come, on-line semi-micronic lithography will be achieved via electron beam or deep UV exposure. Each of these techniques presents advantages (flexibility of direct writing and rapidity of exposure, respectively). The best choice for t
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