Zobrazeno 1 - 9 of 9 pro vyhledávání: '"Anatol Schwersenz"'
3
Charged-Particle Lithography
Autor: Dirk Beyer, Lothar Berger, Johannes Kretz, Anatol Schwersenz
Publikováno v: Nanotechnology
Although, today, the main method for pattering almost all integrated circuits (ICs) is photolithography, charged-particle lithography – where charged particles (electrons, ions) are used for patterning – already has a wide range of applications.
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f47847b5b4a555e1b82c839a48a9c045
https://doi.org/10.1002/9783527628155.nanotech024
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4
NIL template manufacturing using a variable shaped e-beam writer and a new pCAR
Autor: Corinna Koepernik, Anatol Schwersenz, Guenter Hess, Joerg Butschke, Markus Renno, Hubert Schulz, Ecron Thompson, Mathias Irmscher, Florian Letzkus, Holger Sailer
Publikováno v: SPIE Proceedings.
A resolution of 45nm dense lines has been be realized in a 100nm thick commercial available positive tone chemically amplified resist (pCAR) using the Leica SB350 variable shaped beam writer. On the basis of this resist process and by optimization of
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::185acae8b3804d54c2e29e9ee2265387
https://doi.org/10.1117/12.656108
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5
Evaluation of most recent chemically amplified resists for high resolution direct write using a Leica SB350 variable shaped beam writer
Autor: Mathias Irmscher, Karl-Heinz Kliem, Johannes Kretz, Christoph Hohle, Holger Sailer, Dirk Beyer, Ulrich Denker, Monika Boettcher, Frank-Michael Kamm, Kang-Hoon Choi, Frank Thrum, Anatol Schwersenz
Publikováno v: SPIE Proceedings.
E-beam direct writing, one node ahead of advanced optical lithography, can be a time and cost effective option for early device and technology development as well as for fast prototyping. Because of the device complexity only a variable-shaped e-beam
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::2cff5c42f7034ce171fc841e95d2604a
https://doi.org/10.1117/12.655497
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6
Template manufacturing for nanoimprint lithography using existing infrastructure
Autor: Markus Renno, Joerg Butschke, Florian Letzkus, Holger Sailer, Hubert Schulz, Mathias Irmscher, Guenter Hess, Anatol Schwersenz, Ecron Thompson, Boris Vratzov
Publikováno v: SPIE Proceedings.
An initial Nanoimprint template manufacturing process using a state-of-the-art mask front end line has been developed. The process flow is based on conventional 6025 photomask blanks and known basic process steps for chrome and quartz etching. While
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::04215ac6784c2209f3bfbef40e07601e
https://doi.org/10.1117/12.629974
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7
Evaluation of e-beam sensitive CARs for advanced mask making
Autor: Mathias Irmscher, Anatol Schwersenz, Axel Feicke, Martin Tschinkl
Publikováno v: SPIE Proceedings.
An increasingly tighter set of mask specifications requires new equipment, process improvements, and improved e-beam resist materials. Resist profiles, footing behavior and line edge roughness (LER) have strong impacts on CD-uniformity, process bias
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e2c4f8bd0168b2fe44785276cfc2686e
https://doi.org/10.1117/12.617111
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8
Patterning performance of most recent e-beam-sensitive CARs for advanced mask making: an update
Autor: Peter Voehringer, Anatol Schwersenz, Joerg Butschke, Axel Feicke, Mathias Irmscher
Publikováno v: SPIE Proceedings.
Recently developed positive tone CARs (pCAR) and negative tone CARs (nCAR) have been evaluated for mask making using a 50kV e-beam pattern generator. We determined a screening method considering the most important parameters for example resolution, p
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9c9d6ffc704d9da9eddc6f8e173f9a9c
https://doi.org/10.1117/12.568819
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9
Comparison of new film nozzle with standard nozzle for aqueous puddle developing of photomasks
Autor: Werner Saule, Anatol Schwersenz, Christian Buergel, Marlene Strobl, Peter Dress, Martin Tschinkl
Publikováno v: SPIE Proceedings.
With shrinking feature sizes there is a growing demand for improved uniformity values and defect levels especially for aqueous develop during photomask processing. Standard nozzle systems with discrete dispense channels for applying the developer med
Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9328848673e190ed806f0d484d855086
https://doi.org/10.1117/12.504190
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