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Autor:
Vasilina Lapitskaya, Ruslan Trukhan, Tatyana Kuznetsova, Jaroslav Solovjov, Sergei Chizhik, Vladimir Pilipenko, Karyna Liutsko, Anastasiya Nasevich, Maksim Douhal
Publikováno v:
Surfaces, Vol 7, Iss 2, Pp 196-207 (2024)
Nickel films of 40 nm thickness were obtained by means of magnetron sputtering on a single-crystalline silicon substrate. The films were subjected to rapid thermal treatment (RTT) for 7 s until the temperature increased from 200 to 550 °C. By means
Externí odkaz:
https://doaj.org/article/69fdf69855d04801a14aae62e8b83db2
