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pro vyhledávání: '"Anastasia Moskvinova"'
Autor:
Nina Roth, Steffen Oswald, Michael Hietschold, Thomas Waechtler, Heinrich Lang, Alexander Jakob, Anastasia Moskvinova, Stefan E. Schulz, Ramona Ecke, Thomas Gessner, Steffen Schulze
Publikováno v:
Journal of The Electrochemical Society. 156:H453
The thermal atomic layer deposition (ALD) of copper oxide films from the nonfluorinated yet liquid precursor bis(tri-n-butylphosphane)copper(I)acetylacetonate, [( n Bu 3 P) 2 Cu(acac)], and wet O 2 on Ta, TaN, Ru, and SiO 2 substrates at temperatures
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2764d4cb10bbda72b6a75e3e0f44adbb
https://doi.org/10.1149/1.3110842
https://doi.org/10.1149/1.3110842
