Zobrazeno 1 - 10
of 10
pro vyhledávání: '"Analía Fernández Herrero"'
Autor:
Dieter Skroblin, Analía Fernández Herrero, Thomas Siefke, Konstantin Nikolaev, Anna Andrle, Philipp Hönicke, Yves Kayser, Michael Krumrey, Christian Gollwitzer, Victor Soltwisch
Publikováno v:
Nanoscale. 14(41)
The grazing emission X-ray fluorescence (GEXRF) technique offers a promising approach to determining the spatial distribution of various chemical elements in nanostructures. In this paper, we present a comparison with grazing incidence small-angle X-
Autor:
Richard Ciesielski, Leonhard M. Lohr, Analía Fernández Herrero, Andreas Fischer, Alexander Grothe, Heiko Mentzel, Frank Scholze, Victor Soltwisch
Publikováno v:
Review of Scientific Instruments. 94:013904
Smaller and more complex nanostructures in the semiconductor industry require a constant upgrade of accompanying metrological methods and equipment. A central task for nanometrology is the precise determination of structural features of gratings in t
Publikováno v:
Optics Express
Increasing miniaturization and complexity of nanostructures require innovative metrology solutions with high throughput that can assess complex 3D structures in a non-destructive manner. EUV scatterometry is investigated for the characterization of n
Publikováno v:
Modeling Aspects in Optical Metrology VIII.
The increasing complexity and decreasing sizes of nanostructures in microelectronic devices challenge the existing metrology methods. Moreover, as the dimensions of nanostructures continue to decrease, the overall effect of imperfections increases. F
Lamellar gratings are widely used diffractive optical elements; gratings etched into Si can be used as structural elements or prototypes of structural elements in integrated electronic circuits. For the control of the lithographic manufacturing proce
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::dd487ee6131073c400addff1f5493ff4
http://arxiv.org/abs/1810.08011
http://arxiv.org/abs/1810.08011
Autor:
Analía Fernández Herrero, Martin Hammerschmidt, Michael Krumrey, Victor Soltwisch, Mika Pflüger, R. Joseph Kline
Publikováno v:
Journal of Micro/Nanolithography, MEMS, and MOEMS. 19:1
Background: To ensure consistent and high-quality semiconductor production at future logic nodes, additional metrology tools are needed. For this purpose, grazing-incidence small-angle x-ray scattering (GISAXS) is being considered because measurement
Autor:
Frank Scholze, Heiko Mentzel, Sina Jaroslawzew, Analía Fernández Herrero, Victor Soltwisch, Christian Laubis
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXII.
The advance of the semiconductor industry requires new metrology methods, which can deal with smaller and more complex nanostructures. Particularly for inline metrology a rapid, sensitive and non destructive method is needed. Small angle X-ray scatte
Autor:
Analía Fernández Herrero, Victor Soltwisch, Anton Haase, Mika Pflüger, Frank Scholze, Christian Laubis
Publikováno v:
SPIE Proceedings.
As the industry continues to progress along the ITRS roadmap, not only the device dimensions shrink, but the architectures also increase in 3D complexity. Therefore, new metrology approaches for small structures are required. Small angle X-ray scatte
Autor:
Anton Haase, Michael Krumrey, Analía Fernández Herrero, Mika Pflüger, Frank Scholze, Christian Laubis, Jürgen Probst, Victor Soltwisch
Laterally periodic nanostructures have been investigated with grazing-incidence small-angle X-ray scattering (GISAXS) by using the diffraction patterns to reconstruct the surface shape. To model visible light scattering, rigorous calculations of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ca20e894029d1c2691fe8ba4849833dc
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=95555
http://www.helmholtz-berlin.de/pubbin/oai_publication?VT=1&ID=95555
Autor:
James H. Tutt, Hannah Marlowe, Drew M. Miles, Leonid I. Goray, Frank Scholze, Victor Soltwisch, Christian Laubis, Casey T. DeRoo, Randall L. McEntaffer, Analía Fernández Herrero
Publikováno v:
Applied Optics. 55:5548
Off-plane reflection gratings were previously predicted to have different efficiencies when the incident light is polarized in the transverse-magnetic (TM) versus transverse-electric (TE) orientations with respect to the grating grooves. However, mor