Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Anaïs De Lehelle D'Affroux"'
Autor:
Api Warsono, Diana Stephany Fernandez Rodas, Jérôme Rêche, Anaïs De Lehelle D'Affroux, Sébastien Bérard-Bergery
Publikováno v:
Novel Patterning Technologies 2023.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b617bfc0db67c5d57202c7ad8b7f5faf
https://doi.org/10.1117/12.2658384
https://doi.org/10.1117/12.2658384
Autor:
Jérôme Rêche, Api Warsono, Anaïs De Lehelle D'Affroux, Jonas Khan, Sebastian Haumann, Andrea Kneidinger
Publikováno v:
Novel Patterning Technologies 2023.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8cfcfc6fcd062b65ce679aa4ecd128fe
https://doi.org/10.1117/12.2655105
https://doi.org/10.1117/12.2655105
Autor:
Jérôme Rêche, Maxime Argoud, Anaïs De Lehelle D'Affroux, Haidar Al Dujaili, Jonas Khan, Sebastian Haumann, Peter Ledel, Martin Eibelhuber
Publikováno v:
Novel Patterning Technologies 2022.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::13af4968b9a9c3100f6edf1e8db8b23a
https://doi.org/10.1117/12.2613788
https://doi.org/10.1117/12.2613788
Autor:
Maxime Argoud, Anaïs De Lehelle D'Affroux, Martin Eibelhuber, Khatia Benotmane, Sebastian Haumann, Jérôme Reche, Jonas Khan
Publikováno v:
Novel Patterning Technologies 2021.
The NanoImprint Lithography (NIL) technology by using a soft stamp is today ready for high volume manufacturing (HVM) with the global solution proposed by EVG1. This UV-based imprint, using a transparent stamp is now a standard technology and the mos
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d8ddf05fa13d10be3ef59503964102b6
https://doi.org/10.1117/12.2583631
https://doi.org/10.1117/12.2583631