Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Amelie Perraudeau"'
Publikováno v:
Applied Surface Science
Applied Surface Science, Elsevier, 2019, 493, pp.703-709. ⟨10.1016/j.apsusc.2019.07.057⟩
Applied Surface Science, Elsevier, 2019, 493, pp.703-709. ⟨10.1016/j.apsusc.2019.07.057⟩
An atmospheric pressure plasma-enhanced chemical vapor deposition process using a microwave plasma torch has been used for titania thin film synthesis. A dynamic deposition mode was set up to cover a square centimeter surface with a nanostructured Ti
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::5dab8b4ae72e231daadb6382754ca744
https://hal-unilim.archives-ouvertes.fr/hal-02475685/document
https://hal-unilim.archives-ouvertes.fr/hal-02475685/document
Autor:
Christelle Dublanche-Tixier, Sylvain Vedraine, Christophe Chazelas, Pascal Tristant, Amelie Perraudeau, Bernard Ratier
Publikováno v:
EPJ Photovoltaics
EPJ Photovoltaics, EDP sciences, 2019, 10, pp.5. ⟨10.1051/epjpv/2019006⟩
EPJ Photovoltaics, Vol 10, p 5 (2019)
EPJ Photovoltaics, EDP sciences, 2019, 10, pp.5. ⟨10.1051/epjpv/2019006⟩
EPJ Photovoltaics, Vol 10, p 5 (2019)
An original low-temperature atmospheric pressure plasma-enhanced chemical vapor deposition process was used to deposit titanium dioxide thin films. The parametric study in dynamic mode deposition aimed at growing an ideal columnar film composed of al
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fffcee8217bfaa4e08f42a5c2d2eb9f2
https://hal-unilim.archives-ouvertes.fr/hal-02408015
https://hal-unilim.archives-ouvertes.fr/hal-02408015