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pro vyhledávání: '"Amandine Pikon"'
Autor:
Ken Spizuoco, Julia Simon, George G. Barclay, Michael Reilly, Gary G. Zhang, Thomas Cardolaccia, Stéphanie Gaurigan, Peter Trefonas, Lori Anne Joesten, John C. McDermott, Amandine Pikon, Yi Liu, Young Cheol Bae
Two different pattern curing techniques were developed to stabilize first lithographic images for the single-etch double patterning process. The first method uses a surface curing agent (SCA) that is coated on top of the patterned surface to form a p
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b91e116b56f5886401b02283ca936628
