Zobrazeno 1 - 5
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pro vyhledávání: '"Amada Wilkison"'
Autor:
Itty Matthew, Amada Wilkison, Todd P. Lukanc, Cyrus E. Tabery, Makoto Takahashi, Marina V. Plat
Publikováno v:
Optical Microlithography XVIII.
Patterning of dense gratings with sub-wavelength pitches presents a challenge that can be addressed using Resolution Enhancement Techniques (RETs) such as dipole illumination, with the dipole axis perpendicular to the dense line orientation. However,
Publikováno v:
SPIE Proceedings.
Early insertion of ArF nm lithography will occur at the 130 nm node in 2001. Process development for the 100 nm node will also occur this year. Both aggressive gate length reductions and minimum pitch design rules below 250 nm present immediate chall
Publikováno v:
SPIE Proceedings.
Early insertion of ArF nm lithography will occur at the 130 nm node in 2001. Process development for the 100nm node will also occur this year. Both aggressive gate length reductions and minimum pitch design rules below 250nm present immediate challen
Publikováno v:
SPIE Proceedings.
Resolution, R, in optical lithography is often described by the Rayleigh equation: R equals k1(lambda) /NA. Since the 0.25 um generation there has been a trend of aggressive gate length reduction for high performance devices. Leading edge logic techn
Conference
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