Zobrazeno 1 - 10
of 32
pro vyhledávání: '"Altamirano Sanchez, Efrain"'
Autor:
Kim, Dong Gyu, Vereecke, Guy, Puttarame Gowda, Pallavi, Wostyn, Kurt, Kim, Tae Gon, Park, Jin Goo, Altamirano-Sanchez, Efrain
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; August 2023, Vol. 346 Issue: 1 p34-39, 6p
Autor:
Le, Quoc Toan, Gül Arslan, Esen, Fundu, Kevin, Soulie, Jean Philippe, Altamirano-Sanchez, Efrain
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; August 2023, Vol. 346 Issue: 1 p341-345, 5p
Autor:
Nakano, Teppei, Le, Quoc Toan, Kawarazaki, Hikaru, Tanaka, Takayoshi, Altamirano-Sanchez, Efrain
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; August 2023, Vol. 346 Issue: 1 p335-340, 6p
Autor:
Lopez Villanueva, Francisco Javier, Sebaai, Farid, Altamirano-Sanchez, Efrain, Klipp, Andreas
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; August 2023, Vol. 346 Issue: 1 p29-33, 5p
Autor:
Kawarazaki, Hikaru, Nakano, Teppei, Ishizu, Takaaki, Tanaka, Takayoshi, Liu, Wen, Chen, Jason, Kawashima, Tomohiko, Wu, Ai Ping, Sebaai, Farid, Lai, Ju Geng, Yusuke, Oniki, Altamirano-Sanchez, Efrain
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; August 2023, Vol. 346 Issue: 1 p23-28, 6p
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; August 2023, Vol. 346 Issue: 1 p183-188, 6p
Autor:
Tanaka, Yoichi, Gan, Nobuko, Ogawa, Yuuichi, Iino, Hideaki, Chang, Ren Jie, Homkar, Suvidyakumar, Alessio Verni, Giuseppe, Givens, Michael, Lai, Ju Geng, Pacco, Antoine, Brus, Stephan, Arimura, Hiroaki, Oniki, Yusuke, Altamirano-Sanchez, Efrain, Holsteyns, Frank, Horiguchi, Naoto
Publikováno v:
Diffusion and Defect Data Part B: Solid State Phenomena; August 2023, Vol. 346 Issue: 1 p69-73, 5p
Autor:
Martens, Koen, Du Bois, Bert, Kong Siew, Yong, Gupta, Anshul, Veloso, Anabela, Dupuy, Emmanuel, Radisic, Dunja, Altamirano Sanchez, Efrain, Van Roy, Willem, Severi, Simone, Simoen, Eddy
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::66d9289ea977657e9875a77f5f1f05ab
Autor:
De Schepper, Peter, Pret, Alessandro Vaglio, Z el Otell, Ziad, Hansen, Terje, Altamirano-Sanchez, Efrain, De Gendt, Stefan
© 2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim. As the semiconductor industry pursues Moore's law, the demand to obtain smaller features continues. Extreme ultraviolet (EUV) lithography remains one of the primary options for sub- 20 nm patterns.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od______1131::cf998a9839c79c0701a3b1f928619b50
https://lirias.kuleuven.be/handle/123456789/502316
https://lirias.kuleuven.be/handle/123456789/502316
Autor:
Eric Stevens, Yoann Tomczak, Chan, B. T., Altamirano Sanchez, Efrain, Parsons, Gregory N., Delabie, Annelies
Publikováno v:
Chemistry of Materials; 5/22/2018, Vol. 30 Issue 10, p3223-3232, 10p