Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Alphonse Chesneau"'
Publikováno v:
Extreme Ultraviolet (EUV) Lithography IX.
Extreme ultraviolet lithography (EUVL) is targeted for front-up insertion at advanced technology nodes but will be evaluated for back insertion at more mature nodes. EUVL can put two or more mask levels back on one mask, depending upon what level(s)