Zobrazeno 1 - 10
of 166
pro vyhledávání: '"Allen Park"'
Publikováno v:
The European Journal of Development Research. 34:940-977
Household-level agriculture-nutrition linkage (ANL) tends to be strong where food markets are imperfect. In such an environment, markets for cooking services may also be imperfect. Nutrition outcomes of household members, including intrahousehold ine
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::648207e75d66c90dca9659b578812e37
https://doi.org/10.1057/s41287-021-00379-z
https://doi.org/10.1057/s41287-021-00379-z
Autor:
Jarilkasin Ilyasov, Yanyan Liu, Hiroyuki Takeshima, Tanzila Ergasheva, Allen Park, Kamiljon T. Akramov
Publikováno v:
Agricultural Economics. 51:553-565
Agriculture–nutrition linkages (ANLs) have been increasingly investigated in the literature. However, nutritional returns and costs of household agricultural production practices (APPs) in semisubsistence settings are poorly understood. We fill the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3d19f6a530471ec67730475e54c784d8
https://doi.org/10.1111/agec.12571
https://doi.org/10.1111/agec.12571
Autor:
Allen Park, 朴景模
國際經營管理英語碩士學位學程(IMBA)
100
Taiwan and Korean are in fierce competition in the LCD panel industry and together dominate over 70% of the international market share. Business strategies in Taiwan rely on Original Equi
100
Taiwan and Korean are in fierce competition in the LCD panel industry and together dominate over 70% of the international market share. Business strategies in Taiwan rely on Original Equi
Externí odkaz:
http://ndltd.ncl.edu.tw/handle/48631115319242314936
Autor:
朴景模, Allen Park
Taiwan and Korean are in fierce competition in the LCD panel industry and together dominate over 70% of the international market share. Business strategies in Taiwan rely on Original Equipment Manufacturers (OEMs) whereas Korea focuses principally on
Externí odkaz:
http://thesis.lib.nccu.edu.tw/cgi-bin/cdrfb3/gsweb.cgi?o=dstdcdr&i=sid=%22G0099933037%22.
Autor:
Peter Timmer, Eugenio Diaz-Bonilla, Zimeiyi Wang, David Dawe, Abdul Wajid Rana, Valeria Piñeiro, Jarilkasin Ilyasov, Kamiljon T. Akramov, Anjani Kumar, Julia Collins, Stephen Davies, Pramod Kumar Joshi, John M. Ulimwengu, Tsitsi Makombe, Kevin Z. Chen, Evgeny Tsvetnov, Ousmane Badiane, Clemens Breisinger, Fatma Mahfouz, Akhter Ahmed, Allen Park, Nadim Khouri
At the regional and country level, developments in 2018 had important repercussions for food security and nutrition. This section of the 2019 Global Food Policy Report offers perspectives on food policy developments across the major regions: Africa,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::54a3e404de5b0aac041d8fdbf65e0e27
https://doi.org/10.2499/9780896293502_10
https://doi.org/10.2499/9780896293502_10
Autor:
Ellis Chang, Allen Park
Publikováno v:
ECS Transactions. 27:203-207
Wafer inspection and defect classification have been traditionally done in Fab solely using wafer level data. For processes as 45 nm and beyond, device performance has become very sensitive to process variations that include litho conditions and proc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::912ed475cc0c3ca19d29ee405ba82d83
https://doi.org/10.1149/1.3360620
https://doi.org/10.1149/1.3360620
Autor:
Ellis Chang, Allen Park
Publikováno v:
ECS Transactions. 18:183-186
Since the introduction of KLA 2000 series systems in mid 1980, Semiconductor manufacturing has widely adopted automated wafer inspection to detect defects during manufacturing to mitigate excursion and to reduce overall defect density. While the earl
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8df8a3f19a6866ef88f890fb2529239f
https://doi.org/10.1149/1.3096447
https://doi.org/10.1149/1.3096447
Publikováno v:
2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
It is widely understood that a close attention to systematic defect issue is required to succeed in a device development and production of 45 nm and beyond. For 45 nm, use of OPC created tremendous challenges in both optimization and validation of pr
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c4858d3f063ed0fff5d497ac30aedf1
https://doi.org/10.1109/asmc.2010.5551430
https://doi.org/10.1109/asmc.2010.5551430