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of 4
pro vyhledávání: '"Allen G. Owen"'
Autor:
Alecsander D. Mshar, Allen G. Owen, Daniel D. Arnold, Pieter B. Visscher, Randy K. Dumas, Subhadra Gupta
Publikováno v:
AIP Advances, Vol 12, Iss 3, Pp 035230-035230-5 (2022)
We have studied the use of self-assembled block copolymers to pattern multilayers of Co and Pd on silicon wafers. Stacks ranging from four to twelve bilayers of Co (0.3 nm)/Pd (0.8 nm) were sputtered onto Ta/Pd seed layers and capped with 3 nm of Ta
Externí odkaz:
https://doaj.org/article/5e881951c2ea4d92a7d078d5c5e70d47
Publikováno v:
Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. 35:061801
Co/Pd multilayered films with perpendicular magnetic anisotropy were patterned using block copolymer templating. Two methods of achieving phase separation of the block copolymer were compared. A matrix study of etch time and etch angle was carried ou
Publikováno v:
TMS 2015 144th Annual Meeting & Exhibition ISBN: 9783319486086
TMS2015 Supplemental Proceedings
TMS2015 Supplemental Proceedings ISBN: 9781119093466
TMS2015 Supplemental Proceedings
TMS2015 Supplemental Proceedings ISBN: 9781119093466
A statistical Design of Experiments was carried out on the nanopatterning of Co/Pd multilayers using block copolymer templating and ion milling. The multilayers were patterned into welldefined 30 nm nanopillars. The effect of varying ion mill beam po
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f7ad953df3efcdadd4fa41f1d3c922d8
https://doi.org/10.1007/978-3-319-48127-2_38
https://doi.org/10.1007/978-3-319-48127-2_38
Autor:
Hao Su, Samuel C. Schwarm, Subhadra Gupta, Angelique Montgomery, Robert L. Douglas, Allen G. Owen
Publikováno v:
Journal of Applied Physics. 116:113906
The (111) orientation preferred L10 FePtB has been obtained by post-deposition annealing sputtered FeB/Pt multilayers on thermally oxidized silicon substrates. Block copolymer templating was employed to pattern FeBPt film. A matrix study of etch time