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pro vyhledávání: '"Allan Germain"'
Publikováno v:
Journal of the American Ceramic Society. 104:2879-2893
Process development of a maskless N40 via level for security application with multi-beam lithography
Autor:
Philippe Essomba, Gerard ten Berge, Marco Jan-Jaco Wieland, Philippe Brun, Jonathan Pradelles, Stefan Landis, Yoann Blancquaert, Patricia Pimenta-Barros, Isabelle Servin, Arthur Bernadac, Allan Germain
Publikováno v:
Novel Patterning Technologies 2018.
The maskless electron beam lithography system, based on massively parallel electron-beam writing strategy has the ability for low-cost production of truly unique individual chips in volume manufacturing, compatible with optical systems. Mapper Lithog
Autor:
Laureen Baillie
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