Zobrazeno 1 - 10
of 147
pro vyhledávání: '"Alix Gicquel"'
Publikováno v:
Materials Research, Vol 6, Iss 1, Pp 25-37 (2003)
Experimental investigation and modeling of pulsed H2/CH4 plasmas used for diamond deposition are presented. Two plasma configurations are studied : a 2.45 GHz microwave cavity configuration and a 915 MHz surface-wave configuration. Time-resolved meas
Externí odkaz:
https://doaj.org/article/d7449436db504535a2b954368d454c51
Autor:
Gilles Cartry, Dmitry Kogut, Kostiantyn Achkasov, Jean-Marc Layet, Thomas Farley, Alix Gicquel, Jocelyn Achard, Ovidiu Brinza, Thomas Bieber, Hocine Khemliche, Philippe Roncin, Alain Simonin
Publikováno v:
New Journal of Physics, Vol 19, Iss 2, p 025010 (2017)
This paper deals with a study of H ^− /D ^− negative ion surface production on diamond in low pressure H _2 /D _2 plasmas. A sample placed in the plasma is negatively biased with respect to plasma potential. Upon positive ion impacts on the sampl
Externí odkaz:
https://doaj.org/article/f870e08afdd640ee92d8c7a372520d70
Autor:
Alix Gicquel, Gabriele Neretti, Gianpiero Colonna, Laura Laguardia, Thomas Bieber, Francesco Pegoraro, Andrea Cristofolini, Arturo Popoli, Carlos D Pintassilgo, Khaled Hassouni, Olivier Duigou
Publikováno v:
The European physical journal. D, Atomic, molecular, optical and plasma physics (Online) 75 (2021): 183-1–183-35. doi:10.1140/epjd/s10053-021-00186-5
info:cnr-pdr/source/autori:Colonna G.; Pintassilgo C.D.; Pegoraro F.; Cristofolini A.; Popoli A.; Neretti G.; Gicquel A.; Duigou O.; Bieber T.; Hassouni K.; Laguardia L./titolo:Theoretical and experimental aspects of non-equilibrium plasmas in different regimes: fundamentals and selected applications/doi:10.1140%2Fepjd%2Fs10053-021-00186-5/rivista:The European physical journal. D, Atomic, molecular, optical and plasma physics (Online)/anno:2021/pagina_da:183-1/pagina_a:183-35/intervallo_pagine:183-1–183-35/volume:75
info:cnr-pdr/source/autori:Colonna G.; Pintassilgo C.D.; Pegoraro F.; Cristofolini A.; Popoli A.; Neretti G.; Gicquel A.; Duigou O.; Bieber T.; Hassouni K.; Laguardia L./titolo:Theoretical and experimental aspects of non-equilibrium plasmas in different regimes: fundamentals and selected applications/doi:10.1140%2Fepjd%2Fs10053-021-00186-5/rivista:The European physical journal. D, Atomic, molecular, optical and plasma physics (Online)/anno:2021/pagina_da:183-1/pagina_a:183-35/intervallo_pagine:183-1–183-35/volume:75
This paper presents recent activities covering different plasma fields, from both theoretical and experimental point of views. An overview of the present interests of the scientific community is reported here. Starting from a brief description of the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ee2527b2fdbfe631eda62bb3ffbc55ac
http://hdl.handle.net/11585/863138
http://hdl.handle.net/11585/863138
Autor:
Vincent Jacques, Jan Meijer, Alix Gicquel, S. Pezzagna, Jean-François Roch, Nicole Raatz, Roger John, Piernicola Spinicelli, Margarita Lesik, Jocelyn Achard, Alexandre Tallaire
Publikováno v:
physica status solidi (a). 213:2594-2600
The nanometer-scale engineering of single nitrogen-vacancy (NV) centres in diamond can be obtained by low-energy (keV) nitrogen implantation with limited straggling. However, shallow NV centres (a few nanometres deep) generally have inferior overall
Autor:
Y. Addab, Céline Martin, Jocelyn Achard, K. Bystrov, Ovidiu Brinza, Sergey A. Khrapak, Cédric Pardanaud, Alix Gicquel, Gilles Cartry, D.U.B. Aussems, D. Kogut, Ning Ning
Publikováno v:
Journal of Nuclear Materials
Journal of Nuclear Materials, Elsevier, 2018, 500, pp.110-118. ⟨10.1016/j.jnucmat.2017.12.028⟩
Journal of Nuclear Materials, 500, 110-118
Journal of Nuclear Materials, 500, 110-118. Elsevier
Journal of Nuclear Materials, 2018, 500, pp.110-118. ⟨10.1016/j.jnucmat.2017.12.028⟩
Journal of Nuclear Materials, Elsevier, 2018, 500, pp.110-118. ⟨10.1016/j.jnucmat.2017.12.028⟩
Journal of Nuclear Materials, 500, 110-118
Journal of Nuclear Materials, 500, 110-118. Elsevier
Journal of Nuclear Materials, 2018, 500, pp.110-118. ⟨10.1016/j.jnucmat.2017.12.028⟩
Diamond is a promising candidate for enhancing the negative-ion surface production in the ion sources for neutral injection in fusion reactors; hence evaluation of its reactivity towards hydrogen plasma is of high importance. Single crystal and polyc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::53259ac37f69df64958d09f251eaa83c
https://hal-amu.archives-ouvertes.fr/hal-02310941
https://hal-amu.archives-ouvertes.fr/hal-02310941
Autor:
Mehdi Naamoun, Alix Gicquel, Pascal Doppelt, Alexandre Tallaire, Jocelyn Achard, Julien Barjon, Marc Legros
Publikováno v:
Diamond and Related Materials
Diamond and Related Materials, Elsevier, 2015, 58, pp.62-68. ⟨10.1016/j.diamond.2015.06.012⟩
Diamond and Related Materials, 2015, 58, pp.62-68. ⟨10.1016/j.diamond.2015.06.012⟩
Diamond and Related Materials, Elsevier, 2015, 58, pp.62-68. ⟨10.1016/j.diamond.2015.06.012⟩
Diamond and Related Materials, 2015, 58, pp.62-68. ⟨10.1016/j.diamond.2015.06.012⟩
cited By 3; International audience; The development of diamond-based electronic devices designed to operate at high power is strongly hampered by the lack of low dislocation single crystal material. Dislocations in Chemically Vapor Deposited (CVD) di
Autor:
L. William, Mayeul Chipaux, Vincent Jacques, Margarita Lesik, Loïc Toraille, Alix Gicquel, T. Debuisschert, Jocelyn Achard, Ovidiu Brinza, Alexandre Tallaire, Jean-François Roch, T. Plays
Publikováno v:
Diamond and Related Materials
Diamond and Related Materials, Elsevier, 2015, 56, pp.47-53. ⟨10.1016/j.diamond.2015.05.003⟩
Diamond and Related Materials, Elsevier, 2015, 56, pp.47-53. ⟨10.1016/j.diamond.2015.05.003⟩
Thick CVD diamond layers were successfully grown on (113)-oriented substrates. They exhibited smooth surface morphologies and a crystalline quality comparable to (100) electronic grade material, and much better than (111)-grown layers. High growth ra
Publikováno v:
Plasma Processes and Polymers. 12:764-770
A molecular dynamics model is implemented in a way dedicated to simulate initial conditions close to microwave plasma deposition of thick single crystal diamond films. The sticking coefficient of CH 3 radical is obtained for (111) and (100) surface a
Autor:
Alix Gicquel, Jean-François Roch, Jocelyn Achard, Bernd Abel, Ovidiu Brinza, V. Mille, Jan Meijer, Alexandre Tallaire, Sébastien Pezzagna, Vincent Jacques, Margarita Lesik
Publikováno v:
Diamond and Related Materials
Diamond and Related Materials, Elsevier, 2015, 51, pp.55-60. ⟨10.1016/j.diamond.2014.11.010⟩
Diamond and Related Materials, Elsevier, 2015, 51, pp.55-60. ⟨10.1016/j.diamond.2014.11.010⟩
In this work, we explore the ability of plasma assisted chemical vapor deposition (PACVD) operating under high power densities to produce thin high-quality diamond layers with a controlled doping with negatively-charged nitrogen-vacancy (NV−) cente
Publikováno v:
Plasma Sources Science and Technology
Plasma Sources Science and Technology, IOP Publishing, 2017, 26 (11), ⟨10.1088/1361-6595/aa94d8⟩
Plasma Sources Science and Technology, IOP Publishing, 2017, 26 (11), ⟨10.1088/1361-6595/aa94d8⟩
Three different optical diagnostic techniques have been used to measure the density of boron atoms in a microwave generated H2/B2H6 plasma of a diamond deposition reactor. These techniques are: optical emission intensity ratio of doublet 249.677 and
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::526a9d9aa28ec53c609140c3e0104afe
https://hal.archives-ouvertes.fr/hal-01765999
https://hal.archives-ouvertes.fr/hal-01765999