Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Aline Collin"'
Autor:
Arleigh J. Reynolds, Kriya L. Dunlap, Aline Collin, Lawrence K. Duffy, Theresia M. Schnurr, Shannon Jimmie
Publikováno v:
American Journal of Biochemistry and Biotechnology. 15:157-162
Type II Diabetes (T2D) and insulin resistance are growing national health concerns. Obesity is a risk factor for developing T2D and is associated with chronic and systemic inflammation. Exercise on the other hand has been shown to improve glucose met
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a8a4c522f5bfbcd8f93c4155d90fcdcf
https://doi.org/10.3844/ajbbsp.2019.157.162
https://doi.org/10.3844/ajbbsp.2019.157.162
Publikováno v:
The FASEB Journal. 34:1-1
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ead2e3c9a1d133bab43d6500b84711b3
https://doi.org/10.1096/fasebj.2020.34.s1.06741
https://doi.org/10.1096/fasebj.2020.34.s1.06741
Publikováno v:
The FASEB Journal. 32
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b12bd3787b05bff24b596217705d96ac
https://doi.org/10.1096/fasebj.2018.32.1_supplement.lb165
https://doi.org/10.1096/fasebj.2018.32.1_supplement.lb165
Autor:
Vandana Krishnamurthy, Tantiboro Ouattara, Carlton Washburn, Aline Collin, Douglas J. Guerrero
Publikováno v:
ECS Transactions. 44:215-218
Extreme ultraviolet (EUV) exposure is among the front-runners for single-exposure lithography for the 16-nm node and below. One major issue moving toward production is the source power for EUV, which dictates the throughput of the EUV exposure tools.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::fe6377008220b989ccb995d4b191398e
https://doi.org/10.1149/1.3694319
https://doi.org/10.1149/1.3694319
Autor:
Aline Colling Schneider, Carlos Eduardo de Souza Brener, Natália de Freitas Daudt, Letícia Cruz, Cristiane de Bona da Silva
Publikováno v:
Brazilian Journal of Pharmaceutical Sciences, Vol 59 (2023)
Abstract Piper nigrum (black pepper) is used in Indian traditional medicine and its main alkaloid, Piperine (PIP), presents antioxidant, antitumor and neuroprotective pharmacological properties. This substance is insoluble in aqueous media and can ir
Externí odkaz:
https://doaj.org/article/92dc5eab16464e4db75e84f01faf7f8b
Autor:
Douglas J. Guerrero, Michael Weigand, Tantiboro Ouattara, Vandana Krishnamurthy, Aline Collin, Carlton Washburn
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet (EUV) exposure is among the front-runners for single-exposure lithography for the 16-nm node and below. Previous work has shown that assist layers are critical for performing EUV lithography. Assist layers enhance the adhesion of
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1fc450e1da6b0c1c6a470e89a0a63329
https://doi.org/10.1117/12.916469
https://doi.org/10.1117/12.916469