Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Aliaa Kabeel"'
Autor:
Aliaa Kabeel, Sutae Kim, Young Gook Park, Donggyun Kim, Joe Kwan, Sarah Rizk, Kareem Madkour, Marwa Shafee, Jinhee Kim
Publikováno v:
DTCO and Computational Patterning II.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::46ccf129547c41e1009f9b7e6e59a88c
https://doi.org/10.1117/12.2658350
https://doi.org/10.1117/12.2658350
Autor:
Yining Chen, Pang Guo, Joe Kwan, Aliaa Kabeel, Sarah Rizk, Chunshan Du, Xinyi Hu, Qijian Wan, Xizi Yan
Publikováno v:
2022 International Workshop on Advanced Patterning Solutions (IWAPS).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6ce1f91749d808ef83c48810f2b57cc0
https://doi.org/10.1109/iwaps57146.2022.9972262
https://doi.org/10.1109/iwaps57146.2022.9972262
Autor:
Ramy G. Abdelmeged, Srinivas Balagowni, Ahmed Abdelaleem, Joe Kwan, Aliaa Kabeel, Sarah Rizk, Ahmed Abouzeid
Publikováno v:
DTCO and Computational Patterning.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7a99955d68742be8795613f94802c2ed
https://doi.org/10.1117/12.2614085
https://doi.org/10.1117/12.2614085
Autor:
Ahmed Khater, Aliaa Kabeel, Mohamed Ismail, Wael El-Manhawy, Sarah Rizk, Asmaa Rabie, Joe Kwan
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIV.
As the litho hotspot detection runtime is currently in a continuous increase with sub-10nm technology nodes due to the increase of the design and process complexity, new methods and approaches are needed to improve the runtime while guaranteeing high
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::953170bcd30c9ada3a518ce85d8f99c6
https://doi.org/10.1117/12.2551827
https://doi.org/10.1117/12.2551827
Autor:
Nabil Sabry, Sherif Hammouda, Sarah Risk, Joe Kwan, Mostafa Alaa, Wael El-Manhawy, Kareem Madkour, SeungJo Lee, Jongha Park, Marwah Shafee, Aliaa Kabeel, Mohamed Bahnasawi, Abdelrahman Abdelrazek, Jin Hee Kim
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIV.
At the core of Design-technology co-optimization (DTCO) processes, is the Design Space Exploration (DSE), where different design schemes and patterns are systematically analyzed and design rules and processes are co-optimized for optimal yield and pe
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::936816e58b6c28572b6513f6cf00aca2
https://doi.org/10.1117/12.2551916
https://doi.org/10.1117/12.2551916
Autor:
Jae-Hyun Kang, Aliaa Kabeel, Namjae Kim, Sangah Lee, Wael ElManhawy, Marwah Shafee, Sangwoo Jung, Asmaa Rabie, Kareem Madkour, Ahmed ElGhoroury, Seung Weon Paek, Joe Kwan, Ki-Heung Park, Jiwon Oh
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIII.
As the typical litho hotspot detection runtime continue to increase with sub-10nm technology node due to increasing design and process complexity, many DFM techniques are exploring new methods that can expedite some of their advanced verification pro
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6e13a5caba02a84fbb7cb58fe50d3c67
https://doi.org/10.1117/12.2515139
https://doi.org/10.1117/12.2515139
Autor:
Zhengfang Liu, Xinyi Hu, Kareem Madkour, Qijian Wan, Joe Kwan, Guogui Deng, Aliaa Kabeel, Shirui Yu, Meili Zhang, Gensheng Gao, Wael ElManhawy, Mudan Wang, Chunshan Du
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XII.
As the IC technology node moves forward, critical dimension becomes smaller and smaller, which brings huge challenge to IC manufacturing. Lithography is one of the most important steps during the whole manufacturing process and litho hotspots become
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::42ccc04d9e3a51cedd6bd419f660473d
https://doi.org/10.1117/12.2297296
https://doi.org/10.1117/12.2297296
Autor:
Joe Kwan, Xinyi Hu, Legender Yang, Chunshan Du, Elain Zou, Wael ElManhawy, Aliaa Kabeel, Lucas Huang, Kareem Madkour, Sid Hong, Limei Liu, Recoo Zhang, Qijian Wan
Publikováno v:
SPIE Proceedings.
As technology advances, the need for running lithographic (litho) checking for early detection of hotspots before tapeout has become essential. This process is important at all levels—from designing standard cells and small blocks to large intellec
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ce362427749818f032ba95186995f556
https://doi.org/10.1117/12.2258133
https://doi.org/10.1117/12.2258133
Autor:
Joe Kwan, JinYan Wang, Hussein Ali, Aliaa Kabeel, Sid Hong, Wael ElManhawy, Square Liu, Recco Zhang, Helen Li, Kareem Madkour, Danny Hsu, Chunshan Du, Elain Zou, Robben Lee
Publikováno v:
SPIE Proceedings.
In order to resolve the causality dilemma of which comes first, accurate design rules or real designs, this paper presents a flow for exploration of the layout design space to early identify problematic patterns that will negatively affect the yield.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8527ed239b110e7fd66a3d91f0ffa4c1
https://doi.org/10.1117/12.2218540
https://doi.org/10.1117/12.2218540