Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Aliaa Kabeel"'
Autor:
Aliaa Kabeel, Sutae Kim, Young Gook Park, Donggyun Kim, Joe Kwan, Sarah Rizk, Kareem Madkour, Marwa Shafee, Jinhee Kim
Publikováno v:
DTCO and Computational Patterning II.
Autor:
Yining Chen, Pang Guo, Joe Kwan, Aliaa Kabeel, Sarah Rizk, Chunshan Du, Xinyi Hu, Qijian Wan, Xizi Yan
Publikováno v:
2022 International Workshop on Advanced Patterning Solutions (IWAPS).
Autor:
Ramy G. Abdelmeged, Srinivas Balagowni, Ahmed Abdelaleem, Joe Kwan, Aliaa Kabeel, Sarah Rizk, Ahmed Abouzeid
Publikováno v:
DTCO and Computational Patterning.
Autor:
Nabil Sabry, Sherif Hammouda, Sarah Risk, Joe Kwan, Mostafa Alaa, Wael El-Manhawy, Kareem Madkour, SeungJo Lee, Jongha Park, Marwah Shafee, Aliaa Kabeel, Mohamed Bahnasawi, Abdelrahman Abdelrazek, Jin Hee Kim
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIV.
At the core of Design-technology co-optimization (DTCO) processes, is the Design Space Exploration (DSE), where different design schemes and patterns are systematically analyzed and design rules and processes are co-optimized for optimal yield and pe
Autor:
Jae-Hyun Kang, Aliaa Kabeel, Namjae Kim, Sangah Lee, Wael ElManhawy, Marwah Shafee, Sangwoo Jung, Asmaa Rabie, Kareem Madkour, Ahmed ElGhoroury, Seung Weon Paek, Joe Kwan, Ki-Heung Park, Jiwon Oh
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XIII.
As the typical litho hotspot detection runtime continue to increase with sub-10nm technology node due to increasing design and process complexity, many DFM techniques are exploring new methods that can expedite some of their advanced verification pro
Autor:
Zhengfang Liu, Xinyi Hu, Kareem Madkour, Qijian Wan, Joe Kwan, Guogui Deng, Aliaa Kabeel, Shirui Yu, Meili Zhang, Gensheng Gao, Wael ElManhawy, Mudan Wang, Chunshan Du
Publikováno v:
Design-Process-Technology Co-optimization for Manufacturability XII.
As the IC technology node moves forward, critical dimension becomes smaller and smaller, which brings huge challenge to IC manufacturing. Lithography is one of the most important steps during the whole manufacturing process and litho hotspots become
Autor:
Joe Kwan, Xinyi Hu, Legender Yang, Chunshan Du, Elain Zou, Wael ElManhawy, Aliaa Kabeel, Lucas Huang, Kareem Madkour, Sid Hong, Limei Liu, Recoo Zhang, Qijian Wan
Publikováno v:
SPIE Proceedings.
As technology advances, the need for running lithographic (litho) checking for early detection of hotspots before tapeout has become essential. This process is important at all levels—from designing standard cells and small blocks to large intellec
Autor:
Joe Kwan, JinYan Wang, Hussein Ali, Aliaa Kabeel, Sid Hong, Wael ElManhawy, Square Liu, Recco Zhang, Helen Li, Kareem Madkour, Danny Hsu, Chunshan Du, Elain Zou, Robben Lee
Publikováno v:
SPIE Proceedings.
In order to resolve the causality dilemma of which comes first, accurate design rules or real designs, this paper presents a flow for exploration of the layout design space to early identify problematic patterns that will negatively affect the yield.
Autor:
Kabeel, Aliaa, Kim, Sutae, Park, Young Gook, Kim, Donggyun, Kwan, Joe, Rizk, Sarah, Madkour, Kareem, Shafee, Marwa, Kim, Jinhee
Publikováno v:
Proceedings of SPIE; 4/8/2023, Vol. 12495, p124951T-124951T-14, 1p
Autor:
Abdelmeged, Ramy G., Balagowni, Srinivas, Abdelaleem, Ahmed, Kwan, Joe, Kabeel, Aliaa, Rizk, Sarah, Abouzeid, Ahmed
Publikováno v:
Proceedings of SPIE; 1/19/2022, Vol. 12052, p120520L-120520L-13, 1p