Výsledky vyhledávání - "Alfred T. Jeffries"

Attempted Synthesis of the Dithiophene Analogs of Biphenylene

Autor: Alfred T. Jeffries, Winston D. Lloyd, Bansi L. Kalsotra, Cyril Párkányl, Deeng-Lih Huang

Publikováno v: Bulletin des Sociétés Chimiques Belges. 96:237-244

Synthesis of the four possible dithiophene analogs of biphenylene (1), viz., cyclobuta[1,2-b:3,4-d′]dithiophene (3), cyclobuta[1,2,-b:3,4-b′]-dithiophene (4), cyclobuta[1,2-b:3,4-c′]dithiophene (5), and cyclobuta-[1,2-c:3,4-c′]dithiophene (6)

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::f2056aa152174f0c92b638be00a15a4e
https://doi.org/10.1002/bscb.19870960309

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trans-4-Stilbenecarboxylatoalkylpentaamminecobalt(III) Perchlorates: Synthesis and Intramolecular Energy Transfer

Autor: Cyril Párkányi, Lois Shiow-Chyn Yeh Huang, Alfred T. Jeffries, Sung Gun Chu

Publikováno v: Collection of Czechoslovak Chemical Communications. 61:342-354

Three homologs of trans-4-stilbenecarboxylic acid, viz., trans-4-stilbeneacetic acid (18), β-(trans-4-stilbene)propionic acid (19), and γ-(trans-4-stilbene)butyric acid (20) were synthesized and, together with the parent trans-4-stilbenecarboxylic

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::6268638bea6a6ea43e3c189698969548
https://doi.org/10.1135/cccc19960342

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Novel combination of photoactive species: photoresists formed from selectively esterified novolacs and polyfunctional photoactive compounds

Autor: David J. Brzozowy, Alfred T. Jeffries, Ahmad A. Naiini, Paula M. Gallagher-Wetmore

Publikováno v: Advances in Resist Technology and Processing XIV.

The addition of selected PACs to resists comprised of selectively esterified DNQ novolacs improves their performance in terms of side wall angle and resolution compared to resists whose photoactive component is composed of entirely selectively esteri

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::d7a23eabc5d5cc52cb439e596c5c5c61
https://doi.org/10.1117/12.275876

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Selectively esterified novolac resins: a study of resist properties as a function of novolac molecular weight and composition

Autor: Bernard T. Beauchemin, David J. Brzozowy, Edward A. Fitzgerald, Alfred T. Jeffries, Paula M. Gallagher-Wetmore, Ahmad A. Naiini

Publikováno v: SPIE Proceedings.

Supercritical fluids were used to fractionate a conventional 60 meta/40 para cresol novolac into five narrow polydispersivity fractions. Single and multiple fractions were esterified with a DNQ moiety and recombined to obtain a resist having essentia

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::963ed6532e8ef2920ace7b3d9bb07a04
https://doi.org/10.1117/12.241845

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Novel novolac resins produced from 2,6-bishydroxymethyl-p-cresol, p-cresol, and m-cresol: a method to more evenly distribute p-cresol units throughout a novolac resin

Autor: David J. Brzozowy, Alfred T. Jeffries, Shiro Tan, Nancy N. Greene, Tadayoshi Kokubo

Publikováno v: Advances in Resist Technology and Processing X.

In an effort to improve the performance of positive resists by increasing the amounts of o,o- bonding, some m-/p-cresol novolacs were prepared in which a portion of the p-cresol was replaced by 2,6-bishydroxymethyl-p-cresol (BHMPC). This work disting

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::859839279e2bf186b39e0aa4e2f7fdeb
https://doi.org/10.1117/12.154757

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Selectively DNQ-esterified PAC for high-performance positive photoresists

Autor: Rodney J. Hurditch, Medhat A. Toukhy, Shinji Sakaguchi, Alfred T. Jeffries, Tadayoshi Kokubo, Kazuya Uenishi, Yasumasa Kawabe, Sydney G. Slater

Publikováno v: SPIE Proceedings.

DNQ-PACs with varying number of OH groups unesterified were examined for their imaging performance in novolac-based positive resists by means of a dissolution rate study. PACs generally lost dissolution inhibition with increasing numbers of the unest

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::194a2ee59dc02e17c5c17bb7fec2a291
https://doi.org/10.1117/12.59735

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Studies of dissolution inhibition mechanism of DNQ-novolak resist (II): effect of extended ortho-ortho bond in novolak

Autor: Shinji Sakaguchi, Sobhy Tadros, Bernard T. Beauchemin, Kenji Honda, Andrew J. Blakeney, Rodney J. Hurditch, Shiro Tan, Edward A. Fitzgerald, Alfred T. Jeffries

Publikováno v: Advances in Resist Technology and Processing VIII.

A p-cresol trimer sequence was incorporated into a polymeric chain of novolak by copolymerization with m-cresol of a reactive precursor which was prepared by attaching two units of m-cresol to the terminal ortho positions of p-cresol trimer. The resu

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::18243e0644725daa26a5155ae2956e5f
https://doi.org/10.1117/12.46365

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PHOTOLYSIS OF COPPER(II) CHELATES OF β-DIKETONES IN THE PRESENCE OF OXYGEN

Autor: Cyril Párkányl, K. H. Pannell, Alfred T. Jeffries, Pavel Sturm

Publikováno v: Journal of Coordination Chemistry. 11:153-158

The photolysis of solutions of bis(acetylacetonato)copper(II) (I), bis(benzoylacetonato)copper(II) (II). bis(dipivaloyl-methanato)copper(II) (III), and bis(dibenzoylmethanato)copper (II) (IV) in the presence of oxygen has been studied. The destructiv

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::c29fa80705c8a9796cdd734f9e91c157
https://doi.org/10.1080/00958978108079062

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