Zobrazeno 1 - 8
of 8
pro vyhledávání: '"Alfred Steinmann"'
Publikováno v:
CHIMIA, Vol 48, Iss 9 (1994)
Current trends in the light stabilization of polymers and coatings are summarized, with emphasis on UV absorbers and free-radical scavengers.
Externí odkaz:
https://doaj.org/article/e00803d18a854978992a024c11c0a194
Autor:
de Prez, Alfred Steinmann
Publikováno v:
Revue des arts asiatiques, 1935 Jun 01. 9(2), 57-62.
Externí odkaz:
https://www.jstor.org/stable/43474917
Autor:
Markku Auer, Jan H. Näsman, Juha Strandén, Rolf Drewes, Roswell Easton King, Alfred Steinmann, Bruno Rotzinger, Carl-Eric Wilén, Hans Zweifel
Publikováno v:
Macromolecules. 33:5011-5026
Novel polymerizable hindered amine light stabilizers (HALS) such 1-(but-3-enyl)-2,2,6,6-tetramethylpiperidine (1), 1-(undec-10-enyl)-2,2,6,6-tetramethylpiperidine (2), 4-(but-3-enyl)-1,2,2,6,6-pentamethyl-3,4-dehydropiperidine (3), 2-(but-3-enyl)-2,6
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::743c7f7a55f94373f7ba73052314783b
https://doi.org/10.1021/ma0000780
https://doi.org/10.1021/ma0000780
Autor:
Alfred Steinmann
Publikováno v:
Journal de la Société des océanistes. 2:221-224
Steinmann Alfred. Les tissus cultuels « Tampan » du sud de Sumatra et leurs ornements. In: Journal de la Société des océanistes, tome 2, 1946. pp. 221-224.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::074a9398bf3120aef5ebea1ab1ccdc34
https://doi.org/10.3406/jso.1946.1538
https://doi.org/10.3406/jso.1946.1538
Autor:
Alfred Steinmann, Francis J. Bonner, Pier Giorgio Casartelli, Ulrich W. Suter, Gian Paolo Lorenzi, Jose A. Quiroga, Piero Pino
Publikováno v:
Macromolecules. 11:624-626
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d4f55c8393cf42d8b4f54e0668c7df6b
https://doi.org/10.1021/ma60063a041
https://doi.org/10.1021/ma60063a041
Autor:
Alfred Steinmann
Publikováno v:
SPIE Proceedings.
A novel, positive working, silicon-containing resist was developed for use in multilayer resist technology. The complexity of multilayer systems could successfully be reduced due to the dry development behaviour of the resist. Besides, the resist sho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::b81cb158a68c04487c167c71dca96b5d
https://doi.org/10.1117/12.968296
https://doi.org/10.1117/12.968296
Autor:
Alfred Steinmann, Georg Eckert, K. Dittmer, Günter Wagner, Siegfried Behrsing, Walter Hirschberg, Freda Kretschmar, W. Krickeberg, H. Nevermann, Hermann Trimborn, H. E. Kauffmann
Publikováno v:
Zeitschrift für Ethnologie ISBN: 9783662407769
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e79915ab9a3e01ca86ef251e7fd588dc
https://doi.org/10.1007/978-3-662-41260-2_10
https://doi.org/10.1007/978-3-662-41260-2_10
Autor:
Alfred Steinmann, W. Munsterberger
Publikováno v:
Artibus Asiae. 20:94
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::264e4bf764e5853d0945566b686ca4b3
https://doi.org/10.2307/3249493
https://doi.org/10.2307/3249493