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pro vyhledávání: '"Alexey N. Kazakin"'
Autor:
Artem A. Osipov, Gleb A. Iankevich, Anastasia B. Speshilova, Alina E. Gagaeva, Armenak A. Osipov, Yakov B. Enns, Alexey N. Kazakin, Ekaterina V. Endiiarova, Ilya A. Belyanov, Viktor I. Ivanov, Sergey E. Alexandrov
Publikováno v:
Scientific Reports, Vol 12, Iss 1, Pp 1-15 (2022)
Abstract In this work, we demonstrate the high efficiency of optical emission spectroscopy to estimate the etching profile of silicon structures in SF6/C4F8/O2 plasma. The etching profile is evaluated as a ratio of the emission intensity of the oxyge
Externí odkaz:
https://doaj.org/article/c17a47dbb61149f3919f84e4fcf4234c
