Zobrazeno 1 - 7
of 7
pro vyhledávání: '"Alexandre Dervillé"'
Autor:
Johann Foucher, Alexandre Dervillé, Sergio Martinez, Xavier Chevalier, Guillaume Gey, Julien Baderot, Guilhem Bernard
Publikováno v:
Advances in Patterning Materials and Processes XXXVI.
This paper presents how to use machine learning to accelerate the development of lamellar block copolymer process. The first part introduces an automated algorithm to measure lamellar CD-SEM images oriented to allow fast images screening, identify an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a30c6a51e484342d67cd6afb252f3e22
https://doi.org/10.1117/12.2514955
https://doi.org/10.1117/12.2514955
Autor:
Guillaume Gey, Sergio Martinez, Alexandre Dervillé, Julien Baderot, Guilhem Bernard, Johann Foucher
Publikováno v:
Advanced Etch Technology for Nanopatterning VIII.
The latest advances in Machine Learning (ML) produce results with unprecedented accuracy, and could signal a new era in the smart manufacturing field. We propose a framework designed to work alongside experts: learning from them and optimizing their
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::da1bad0c43d33b8bb14f3613bb6d15bb
https://doi.org/10.1117/12.2514705
https://doi.org/10.1117/12.2514705
Autor:
Florian Pinzan, Julien Baderot, Y Zimmermann, Aurelien Labrosse, Sergio Martinez, Guilhem Bernard, Johann Foucher, Hanna Grönqvist, Alexandre Dervillé
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXXI.
The development and integration of new materials and structures at the nanoscale require multiple parallel characterizations in order to control mostly physico-chemical properties as a function of applications. Among all properties, we can list physi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e695d3e3d2dc218cab3fd503b0a4a25d
https://doi.org/10.1117/12.2258093
https://doi.org/10.1117/12.2258093
Autor:
Hanna Grönqvist, Johann Foucher, Sergio Martinez, Alexandre Dervillé, Julien Baderot, Guilhem Bernard, Aurelien Labrosse, Y Zimmermann
Publikováno v:
SPIE Proceedings.
We introduce a set of designed tools for the analysis of lithography patterns and nano structures. The classical metrological analysis of these objects has the drawbacks of being time consuming, requiring manual tuning and lacking robustness and user
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d5f44a5bfa045e07374e54d657078cd8
https://doi.org/10.1117/12.2258612
https://doi.org/10.1117/12.2258612
Akademický článek
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Autor:
Aurelien Labrosse, Johann Foucher, Sebastian W. Schmidt, Sebastian Schade, Sandra Bos, Bernd Irmer, Alexandre Dervillé
Publikováno v:
SPIE Proceedings.
In this paper, we present our most recent approach on the extraction of reliable atomic force microscopy (AFM) tip dimensions from scanning electron microscopy (SEM) images in order to answer future requirements on ever shrinking CD AFM tips. We demo
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dd79f1e6294989e62ad11f4aa3e5b92e
https://doi.org/10.1117/12.2085977
https://doi.org/10.1117/12.2085977
Autor:
R. Bouyssou, Sandra Bos, R. Thérèse, Johann Foucher, N. Chesneau, Guillaume Evin, Jerome Hazart, A. Largent, C. Dezauzier, Alexandre Dervillé
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXVIII.
The manufacturing of next generation semiconductor devices forces metrology tool providers for an exceptional effort in order to meet the requirements for precision, accuracy and throughput stated in the ITRS. In the past years hybrid metrology (base
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::14c46976bebece271e9b57616938045b
https://doi.org/10.1117/12.2046484
https://doi.org/10.1117/12.2046484