Výsledky vyhledávání - "Alexandre CRISCI"

Modeling multilayer coating systems in solar receivers

Autor: Danying Chen, Frédéric Mercier, Johann Colas, Alexandre Crisci, Michel Pons, Marianne Balat-Pichelin, Raphaël Boichot, Ludovic Charpentier

Publikováno v: Surface and Coatings Technology
Surface and Coatings Technology, Elsevier, 2020, 399, pp.126102. ⟨10.1016/j.surfcoat.2020.126102⟩

International audience; A comprehensive model to predict the stress evolution in a multilayer coating during its use in solar receivers is proposed. The model takes into account residual stress in the coatings, thermal gradient in the structure and h

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::d2f1994e5565664b28b9ee6f102e6a0f
https://hal.archives-ouvertes.fr/hal-02906145

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Improved critical temperature of superconducting plasma-enhanced atomic layer deposition of niobium nitride thin films by thermal annealing

Autor: Francois Weiss, Victor Marchetto, G. Berthomé, Frédéric Mercier, Arnaud Mantoux, Ivane Bottala-Gambetta, Roman Reboud, Laetitia Rapenne, Alexandre Crisci, A. Sulpice, Manoel Jacquemin, Carmen Jiménez, Liang Tian, Elisabeth Blanquet

Publikováno v: Thin Solid Films
Thin Solid Films, Elsevier, 2020, 709, pp.138232. ⟨10.1016/j.tsf.2020.138232⟩

The efficiency of the superconducting radio frequency cavities composed of Nb required the deposition of thickness-controlled multilayer coatings of superconductor-insulator-superconductor (S-I-S) on the internal surfaces of the cavities. Herein, we

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1b98249980bb3976289b41cc0739e041
https://hal.archives-ouvertes.fr/hal-03053402

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Porous Hollow PtNi/C Electrocatalysts: Carbon Support Considerations To Meet Performance and Stability Requirements

Autor: Yan Busby, Plamen Atanassov, Vincent Martin, Frédéric Maillard, Raphaël Chattot, Tristan Asset, Aleksey Serov, Céline Bonnaud, Nathalie Job, Vaios Stergiopoulos, Laetitia Dubau, Alexandre Crisci

Publikováno v: ACS Catalysis
ACS Catalysis, American Chemical Society, 2018, 8 (2), pp.893-903. ⟨10.1021/acscatal.7b03539⟩

The influence of the texture, structure, and chemistry of different carbon supports on the morphological properties, oxygen reduction reaction (ORR) activity, and stability of porous hollow PtNi nanoparticles (NPs) was investigated. The carbon nanoma

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::1a79fe880131283cb5e53f7eb2110366
https://doi.org/10.1021/acscatal.7b03539

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Growth of aluminum nitride on flat and patterned Si (111) by high temperature halide CVD

Autor: Mikhail Chubarov, Frédéric Mercier, Thierry Encinas, Sabine Lay, Stéphane Coindeau, Frédéric Charlot, Gabriel Ferro, Roman Reboud, Raphaël Boichot, Alexandre Crisci

Publikováno v: Thin Solid Films. 623:65-71

The aim of the present study is to evaluate the possibility of improving crystalline quality of AlN deposited on Si (111) substrates by implementation of substrate patterning. Growth on flat Si (111) substrates was conducted to investigate influence

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::e38421a62cc039cf7f992ca76f3d177e
https://doi.org/10.1016/j.tsf.2016.11.045

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All at once: how electrochemistry can be used to design and access multiple compositions in a single sample

Autor: Vitor A. Ruffo, Marian Chatenet, Alexandre Crisci, Giuseppe A. Camara

Publikováno v: Journal of Materials Chemistry A
Journal of Materials Chemistry A, Royal Society of Chemistry, 2017, 5 (43), pp.22641-22647. ⟨10.1039/c7ta05036d⟩

International audience; A library of binary PtRh thin-film electrocatalysts was obtained by potentiostatic co-electrodeposition of Pt4+ and Rh3+ on a gold wire in a capillary cell, the capillary separating on the one hand the Pt4(+) compartment and o

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a38bf118d31eff3ad2f96589148fcbd0
https://doi.org/10.1039/c7ta05036d

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Growth of boron nitride films on w-AlN (0001), 4° off-cut 4H-SiC (0001), W (110) and Cr (110) substrates by Chemical Vapor Deposition

Autor: Roman Reboud, Raphaël Boichot, Sabine Lay, Michel Pons, Thierry Encinas, Alexandre Crisci, Stéphane Coindeau, Mikhail Chubarov, Frédéric Mercier, Elisabeth Blanquet, N. Coudurier

Publikováno v: Crystal Research and Technology. 51:231-238

Boron Nitride is a promising group 13-group 15 compound material that exhibits various interesting properties like wide band gap, chemical stability, attractive mechanical properties and other. The growth behavior of this material has not been invest

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::9d2298374bf5220575eb536541110fbb
https://doi.org/10.1002/crat.201500284

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Aluminum nitride thin films deposited by hydrogen plasma enhanced and thermal atomic layer deposition

Autor: Carmen Jiménez, Liang Tian, Michel Pons, S. Ponton, Fabien Volpi, M. Benz, Roman Reboud, Elisabeth Blanquet, Christophe Vallée, Gael Giusti, Alexandre Crisci, Laetitia Rapenne, Arnaud Mantoux

Publikováno v: Surface and Coatings Technology
Surface and Coatings Technology, 2018, 347, pp.181-190. ⟨10.1016/j.surfcoat.2018.04.031⟩
Surface and Coatings Technology, Elsevier, 2018, 347, pp.181-190. ⟨10.1016/j.surfcoat.2018.04.031⟩
Surface and Coatings Technology, Elsevier, 2018, 347, pp.181-190. 〈10.1016/j.surfcoat.2018.04.031〉

Plasma enhanced atomic layer deposition (PE-ALD) of aluminum nitride (AlN) thin films often utilizes NH3 or a mixture of N2 and H2 as a plasma source. However, the possibility of separating the activation step from the nitridation step by using H2 al

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::ae86905467a17a0863da50f775894cdc
https://hal.science/hal-01809316

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