Zobrazeno 1 - 2
of 2
pro vyhledávání: '"Alexander S. Voloshin"'
Autor:
Lev V. Shanidze, Anton S. Tarasov, Mikhail V. Rautskiy, Fyodor V. Zelenov, Stepan O. Konovalov, Ivan V. Nemtsev, Alexander S. Voloshin, Ivan A. Tarasov, Filipp A. Baron, Nikita V. Volkov
Publikováno v:
Applied Sciences, Vol 11, Iss 16, p 7498 (2021)
We fabricated Cu-doped TiNxOy thin film resistors by using atomic layer deposition, optical lithography, dry etching, Ti/Cu/Ti/Au e-beam evaporation and lift-off processes. The results of the measurements of the resistance temperature dependence, non
Externí odkaz:
https://doaj.org/article/bca7aaa603cb4b88ba8b2c8800764b4b
Autor:
Stepan O. Konovalov, Ivan V. Nemtsev, Lev V. Shanidze, F. A. Baron, A. S. Tarasov, Alexander S. Voloshin, I. A. Tarasov, N. V. Volkov, Mikhail V. Rautskiy, Fyodor V. Zelenov
Publikováno v:
Applied Sciences, Vol 11, Iss 7498, p 7498 (2021)
Applied Sciences
Volume 11
Issue 16
Applied Sciences
Volume 11
Issue 16
We fabricated Cu-doped TiNxOy thin film resistors by using atomic layer deposition, optical lithography, dry etching, Ti/Cu/Ti/Au e-beam evaporation and lift-off processes. The results of the measurements of the resistance temperature dependence, non
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::6b67acd235f7f0cab46cfb509a0c993b
https://www.mdpi.com/2076-3417/11/16/7498
https://www.mdpi.com/2076-3417/11/16/7498