Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Alexander Koschik"'
Autor:
Giovanni Dal Maso, Alexander Gabard, Malek Haj Tahar, Peter-Raymond Kettle, Klaus Kirch, Daniela Kiselev, Alexander Koschik, Andreas Knecht, Daniel Laube, Angela Papa, Thomas Rauber, Davide Reggiani, Rebecca Riccioli, Jochem Snuverink, Vadim Talanov, Eremey Valetov
Publikováno v:
EPJ Web of Conferences, 282
Currently, PSI delivers the most intense continuous muon beam in the world with up to a few 108 µ+/s. The High-Intensity Muon Beams (HIMB) project is developing a new target station and muon beamlines able to deliver 1010 µ+/s, with a huge impact f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::e298af4915ae2dafdfc0ea9146763901
https://hdl.handle.net/20.500.11850/607014
https://hdl.handle.net/20.500.11850/607014
Publikováno v:
Microelectronics Reliability. 50:1407-1412
Modeling of critical dimensions scanning electron microscopy with sub-nanometer uncertainty is required to provide a metrics and to avoid yield loss in the processing of advanced CMOS technologies. In this paper, a new approach is proposed, which inc
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::dac983cb84b627e68c0a51690b448e59
https://doi.org/10.1016/j.microrel.2010.07.120
https://doi.org/10.1016/j.microrel.2010.07.120
Publikováno v:
Scanning Microscopy 2010.
Besides the use of the most sophisticated equipment, accurate nanometrology for the most advanced CMOS processes requires that the physics of image formation in scanning electron microscopy (SEM) being modeled to extract critical dimensions. In this
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::8d41ce6529150c47767efe2a864fadfc
https://doi.org/10.1117/12.853804
https://doi.org/10.1117/12.853804