Zobrazeno 1 - 10
of 18
pro vyhledávání: '"Alexander I. Ershov"'
Autor:
Andrew LaForge, Jayson Stewart, Slava Rokitski, Robert J. Rafac, Igor V. Fomenkov, David C. Brandt, Michael Purvis, Chirag Rajyaguru, Mathew Abraham, Yezheng Tao, Daniel Brown, Alexander Schafgans, Silvia De Dea, Alexander I. Ershov, Georgiy O. Vaschenko
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2018.
We provide an overview of laser-produced-plasma (LPP) extreme-ultraviolet (EUV) source performance to enable high volume manufacturing and improvements in various technologies for scaling output power of the source. Several companies have multiple sy
Autor:
Jacek Borysow, Alexander I. Ershov
Publikováno v:
Plasma Sources Science and Technology. 16:798-802
An intense source of atomic oxygen is reported in this paper. Oxygen atoms were produced in an Ar/O2, 2.45 GHz, microwave discharge at flow rates ranging from 10 to 150 sccm and pressures from 0.5 to 4 Torr. The absolute flow rate of atomic oxygen pe
Autor:
Igor V. Fomenkov, David C. Brandt, Alexander N. Bykanov, Alexander I. Ershov, William N. Partlo, David W. Myers, Norbert R. Böwering, Georgiy O. Vaschenko, Oleh V. Khodykin, Jerzy R. Hoffman, Ernesto Vargas L., Rodney D. Simmons, Juan A. Chavez, Christopher P. Chrobak
Publikováno v:
SPIE Proceedings.
Autor:
M. J. Neumann, Robert L. Bristol, Oleh V. Khodykin, M. Cruce, Alexander I. Ershov, E. Ritz, David N. Ruzic, H. Qiu, R. A. Defrees
Publikováno v:
SPIE Proceedings.
A critical issue leading to decreased mirror lifetime is the buildup of debris on the surface of the primary mirror optics that comes from the use of both Sn and Li in GDPP or LPP. While lithium can easily be evaporated from the optic surface initial
Autor:
Leonard Lublin, Palash P. Das, Alexander I. Ershov, David J. Warkentin, Jody Vipperman, Brian C. Klene, Ronald L. Spangler
Publikováno v:
SPIE Proceedings.
With the advent of 193 nm systems processing 300 mm wafers, the production lithography cell is about to undergo a technology shift. The mechanism for delivering the beam from the light source to the illumination system, here referred to as a Beam Del
Autor:
Herve A. Besaucele, Robert J. Rafac, Vladimir B. Fleurov, Toshihiko Ishihara, Alexei Lukashev, Daniel J. W. Brown, Paolo Zambon, Daniel J. Colon, Patrick O'Keeffe, Alexander I. Ershov, Fedor B. Trintchouk
Publikováno v:
SPIE Proceedings.
Since the announcement in March 2002 of plans to develop an advanced light source to meet the future spectral power and cost requirements of photolithography, we have made significant progress in the development and productization of the core technol
Autor:
Scot T. Smith, Alexander I. Ershov
Publikováno v:
SPIE Proceedings.
Several approaches for high-resolution laser metrology have been discussed. One approach is to use a multiple-etalon spectrometer, which has two or more etalons with different FSRs. This approache can increase both the resolution at FWHM and the tail
Publikováno v:
SPIE Proceedings.
The spectral shape requirements for an ArF laser for 193 nm microlithography are expected to be about 2X tighter than at 248nm. This is in part due to the dispersion of fused silica and CaD 2 at 193nm and in part due to the push by the lens designers
Autor:
Richard L. Sandstrom, Thomas P. Duffey, William N. Partlo, Eckehard D. Onkels, Alexander I. Ershov
Publikováno v:
SPIE Proceedings.
Highly line-narrowed F 2 laser operation in the VUV has been achieved for the first time by means of a master oscillator/power amplifier laser design. Different concepts have ben investigated experimentally for the master oscillator (MO) in order to
Autor:
Dmitri V. Gaidarenko, Thomas Hofmann, Scot T. Smith, Kyle R. Webb, Herve A. Besaucele, William N. Partlo, Rick Eis, Paul C. Melcher, Vladimir B. Fleurov, Alexander I. Ershov, Bernard K. Nikolaus, Palash P. Das, Jean-Marc Hueber
Publikováno v:
SPIE Proceedings.
We report the performance of a very high repetition rate ArF laser optimized for next generation, high NA, high throughput scanner. The laser's repetition rate exceeds 4kHz, at 5mJ, and at bandwidths of less than 1.2 pm. We discuss the complexity of