Zobrazeno 1 - 4
of 4
pro vyhledávání: '"Alexander A. Kang"'
Autor:
Morgan, Alexander Liang Kang
Antimicrobial resistance (AMR) and coronavirus disease 2019 (COVID-19) currently represent two of the most important threats to human health, with both AMR and COVID-19 resulting in millions of deaths worldwide and severe socioeconomic disruption. It
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=od_______463::3732f51bc7570c5eea4100cdef8f1553
https://hdl.handle.net/1842/39348
https://hdl.handle.net/1842/39348
Autor:
Elmer Guzman, Alexander A. Kang, Alison Goate, Michel Giroux, Kenneth S. Kosik, Antonio Diaz, Daniel Boctor, Jennifer N. Rauch, Celeste M. Karch, Israel Hernandez, Ana Maria Cuervo, Cezary Zekanowski, Gabriel Luna, Cassidy R. Hinman, Nadia J. Storm, Vesna Cerovac, Steven K. Fisher, Honjun Zhou
Tau inclusions are a shared feature of many neurodegenerative conditions and tau mutations lead to frontotemporal dementia. Approaches to treatment of these conditions have focused directly on the tau protein by targeting its post-translational modif
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::a5d4b38bd010f38104df94c7500fbdf4
https://doi.org/10.1101/500801
https://doi.org/10.1101/500801
Autor:
Phillip Peters, Michael Belisle, Alexander Sou-Kang Ko, Han-Wen Chen, Pieter Boelen, Kent Child, James S. Papanu, Steven Verhaverbeke, Roman Gouk, Elias Martinez
Publikováno v:
22nd European Mask and Lithography Conference.
Photon induced haze resulting from sulfur residues that remain after cleaning and photoresist stripping is a key challenge for 193 nm photomasks. In previously reported work, sulfur-free processes for cleaning and photoresist removal on mask blanks w
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c3d90318fd0d698911b9474cd9b39e3e
https://doi.org/10.1117/12.692644
https://doi.org/10.1117/12.692644
Autor:
Steven Verhaverbeke, Brian J. Brown, Kent Child, Roman Gouk, Suresh Shrauti, Cole Franklin, Pieter Boelen, James S. Papanu, Elias Martinez, Alexander Sou-Kang Ko, Han-Wen Chen
Publikováno v:
SPIE Proceedings.
Sub-pellicle defects and haze increase due to photon reaction with cleaning chemistry residues are especially problematic on photomasks for 193 nm and shorter exposure wavelengths. In addition to mask cleaning, these chemistries are also used for pho
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cbfe44c016eb7f2a3bf281b662a0b602
https://doi.org/10.1117/12.632294
https://doi.org/10.1117/12.632294