Zobrazeno 1 - 10
of 82
pro vyhledávání: '"Alex P. G. Robinson"'
Autor:
Philip D. Prewett, Cornelis W. Hagen, Claudia Lenk, Steve Lenk, Marcus Kaestner, Tzvetan Ivanov, Ahmad Ahmad, Ivo W. Rangelow, Xiaoqing Shi, Stuart A. Boden, Alex P. G. Robinson, Dongxu Yang, Sangeetha Hari, Marijke Scotuzzi, Ejaz Huq
Publikováno v:
Beilstein Journal of Nanotechnology, Vol 9, Iss 1, Pp 2855-2882 (2018)
Following a brief historical summary of the way in which electron beam lithography developed out of the scanning electron microscope, three state-of-the-art charged-particle beam nanopatterning technologies are considered. All three have been the sub
Externí odkaz:
https://doaj.org/article/b7160a201e20410287590c4f76d1362d
Publikováno v:
Quantum Beam Science, Vol 4, Iss 2, p 19 (2020)
Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) chemically modified by electron beam (EB) irradiation, which is composed of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT). Irradiating a NPHT by EB could successfully induce
Externí odkaz:
https://doaj.org/article/c57360b448f34ad0a988ad5f9f7cd770
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Carmen Popescu, Greg O'Callaghan, Alex McClelland, Catherine Storey, John Roth, Ed A. Jackson, Alex P. G. Robinson
Publikováno v:
Advances in Patterning Materials and Processes XL.
Autor:
Dongxu Yang, Xiangyi Chen, Dongsheng He, Andreas Frommhold, Xiaoqing Shi, Stuart A. Boden, Maria A. Lebedeva, Olga V. Ershova, Richard E. Palmer, Ziyou Li, Haofei Shi, Jianzhi Gao, Minghu Pan, Andrei N. Khlobystov, Thomas W. Chamberlain, Alex P. G. Robinson
Publikováno v:
The Journal of Physical Chemistry Letters. 13:1578-1586
The development of patterning materials (“resists”) at the nanoscale involves two distinct trends: one is toward high sensitivity and resolution for miniaturization, the other aims at functionalization of the resists to realize bottom-up construc
Autor:
Carmen Popescu, Greg O'Callaghan, Alexandra McClelland, Catherine Storey, John Roth, Ed Jackson, Alex P. G. Robinson
Publikováno v:
International Conference on Extreme Ultraviolet Lithography 2022.
Autor:
Carmen Popescu, Greg O'Callaghan, Alex McClelland, John Roth, Ed Jackson, Alex P. G. Robinson
Publikováno v:
Advances in Patterning Materials and Processes XXXIX.
Autor:
Alex P. G. Robinson, Li-Ting Tseng, Yasin Ekinci, Xiaolong Wang, Carmen Popescu, Dimitrios Kazazis
Publikováno v:
Microelectronic Engineering. 210:8-13
We report on a novel and simple pattern transfer process into Si via fullerene-based spin-on-carbon (SOC) hard masks in this work. Electron beam lithography and extreme ultraviolet interference lithography techniques are used to pattern high-resoluti
Autor:
Peter H. Robbs, Ruba Hendi, James H. R. Tucker, Klaudia Englert, Neil V. Rees, Alex P. G. Robinson
Publikováno v:
Nanoscale advances. 2(10)
The synthesis and characterisation of novel metal-modified DNA precursors for fuel cell catalyst development are described. Material precursors in the form of metal–DNA complexes were prepared through the reaction of DNA with cisplatin at various l
Publikováno v:
Quantum Beam Science
Volume 4
Issue 2
Quantum Beam Science, Vol 4, Iss 19, p 19 (2020)
Volume 4
Issue 2
Quantum Beam Science, Vol 4, Iss 19, p 19 (2020)
Directed self-assembly (DSA) was investigated on self-assembled monolayers (SAMs) chemically modified by electron beam (EB) irradiation, which is composed of 6-(4-nitrophenoxy) hexane-1-thiol (NPHT). Irradiating a NPHT by EB could successfully induce