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pro vyhledávání: '"Alex Krokhmal"'
Autor:
Paul Ryan, Alex Dikopoltsev, Silvio Rabello, Yuri Vinshtein, Rahul Korlahalli, Jie Li, Yang Song, Matthew Wormington, Israel Reichental, Alex Krokhmal, Adam Ginsburg, Franklin Wong
Publikováno v:
Metrology, Inspection, and Process Control for Semiconductor Manufacturing XXXV.
We have developed a novel in-line solution for the characterization and metrology of high-aspect ratio (HAR) semiconductor structures using transmission small-angle X-ray scattering (SAXS). The solution consists of the Sirius-XCD® tool, NanoDiffract
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::c2f5f9ec453ae34f1c25b574cdffd3e6
https://doi.org/10.1117/12.2583966
https://doi.org/10.1117/12.2583966
