Zobrazeno 1 - 9
of 9
pro vyhledávání: '"Alex Kabansky"'
Autor:
Harry Lee, Alex Kabansky
Publikováno v:
Solid State Phenomena. :59-62
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4eb19fed964ba1652dbc28b8e469fb33
https://doi.org/10.4028/www.scientific.net/ssp.103-104.59
https://doi.org/10.4028/www.scientific.net/ssp.103-104.59
Autor:
Samantha Tan, Ted Ming-Lang Guo, Chan Lon Yang, Kai Ping Wang, Autumn Yeh, Chin Cheng Chien, Michael Chan, Teh-Tien Su, Alex Kabansky, Jack Kao, J.Y. Wu, Zhi Jian Wang
Publikováno v:
Solid State Phenomena. 195:79-81
Chemical and physical modifications of photoresist and BARC during plasma patterning process on HKMG structure can cause residual defects and yield loss that challenges the subsequent wet cleaning process to resolve this issue. The chemical behavior
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::cb55c141e8394ab8d68c820a88601256
https://doi.org/10.4028/www.scientific.net/ssp.195.79
https://doi.org/10.4028/www.scientific.net/ssp.195.79
Publikováno v:
Solid State Phenomena. :195-198
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::30174a8eec68f82e2879a535b2aa6344
https://doi.org/10.4028/www.scientific.net/ssp.65-66.195
https://doi.org/10.4028/www.scientific.net/ssp.65-66.195
Publikováno v:
MRS Proceedings. 876
A novel concept of solid-state chemical sensors for neutral radical detection in gas-phase and related technique are proposed based on chemiluminescence of sensing materials excited by heterogeneous chemical reactions of radicals on sensor surface. T
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::4cd1ffdbad53f47aa9a253c6ec3b602e
https://doi.org/10.1557/proc-876-r8.64
https://doi.org/10.1557/proc-876-r8.64
Selected, peer reviewed papers from the 11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), September 17-19, 2012, Gent, Belgium
Autor:
Karen Reinhardt, Werner Kern
Handbook of Silicon Wafer Cleaning Technology, Third Edition, provides an in-depth discussion of cleaning, etching and surface conditioning for semiconductor applications. The fundamental physics and chemistry associated with wet and plasma processin
Autor:
Karen Reinhardt, Werner Kern
The second Edition of the Handbook of Silicon Wafer Cleaning Technology is intended to provide knowledge of wet, plasma, and other surface conditioning techniques used to manufacture integrated circuits. The integration of the clean processes into th
UCPSS 2004Proceddings of the 7th International Symposium on Ultra Cleyn Processing of Silicon Surfaces (UCPSS), Brussels, Belgium, Sept. 20-22, 2004