Zobrazeno 1 - 6
of 6
pro vyhledávání: '"Alex Goldenshtein"'
Autor:
Gian Francesco Lorusso, Danilo De Simone, Mohamed Zidan, Joren Severi, Alain Moussa, Bappaditya Dey, Sandip Halder, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Stefan De Gendt, Philippe Leray
Publikováno v:
Japanese Journal of Applied Physics. 62:SG0808
One of the many constraints of high numerical aperture extreme ultraviolet lithography is related to resist thickness. A critical consequence of moving from the current 0.33 to 0.55 NA (high NA) is depth of focus reduction. The question we seek to an
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::2ccdf54108f8c454e658d681a4ef2a0c
https://doi.org/10.35848/1347-4065/acc3a4
https://doi.org/10.35848/1347-4065/acc3a4
Autor:
Gaetano Santoro, Kevin Houchens, Janusz Bogdanowicz, Moshe Elizov, Lior Yaron, Michael Chemama, Alex Goldenshtein, Amit Zakay, Noam Amit, Basoene Briggs, Antoine Pacco, Romain Delhougne, Andrew Cockburn, Yaniv Abramovitz, Aviram Tam, Ofer Adan, Hans Mertens, Anne-Laure Charley, Naoto Horiguchi, Philippe Leray, Gian F. Lorusso
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::195e93429c6fd40ba22635775d2aeaee
https://doi.org/10.1117/12.2613771
https://doi.org/10.1117/12.2613771
Autor:
Carol Boye, DukKyun Moon, Steven McDermott, Norbert Arnold, Nicole Saulnier, Felix Levitov, Sam Choi, Alex Goldenshtein, Uri Smolyan, Noam Amit, Injo Ok, Iqbal Saraf
Publikováno v:
2022 33rd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC).
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::52bc90878a883049cac5651f227b2459
https://doi.org/10.1109/asmc54647.2022.9792525
https://doi.org/10.1109/asmc54647.2022.9792525
Autor:
Lior Shoval, Vladislav Kudriashov, Ilan Englard, Alon Litman, C. C. Lin, Ran Brikman, Greg Hughes, Alex Goldenshtein, Shmoolik Mangan
Publikováno v:
SPIE Proceedings.
Extreme ultraviolet (EUV) e-beam patterned mask inspection (EBPMI) has been proposed by Applied Materials as a cost-effective solution for high volume manufacturing (HVM) in mask shops and fabs. Electron beam inspection technology is currently availa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b6c6fbc6b1d86eae23e4cd9fe426c492
https://doi.org/10.1117/12.898854
https://doi.org/10.1117/12.898854
Publikováno v:
SPIE Proceedings.
This paper examines the effects of mask printability of various OPC defect types on a MoSi APSM mask using an MSM-100 AIMS tool operating at 248nm as a printability prediction tool. Printability analysis will be used to address differences in intensi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e72f14c9ef071684e6c21813301dacbd
https://doi.org/10.1117/12.438407
https://doi.org/10.1117/12.438407
Autor:
Alex Goldenshtein, Yaron I. Gold
Publikováno v:
SPIE Proceedings.
This paper presents a method for increasing the contrast-to- noise ratio and spatial resolution of SEM images. The method uses de-convolution to eliminate the blur caused by an electron beam spot that covers more than a single pixel. An approximating
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d30539207d1d9dfc0f39f2c4209e133a
https://doi.org/10.1117/12.308774
https://doi.org/10.1117/12.308774