Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Alex Eidukonis"'
Autor:
J.C. Olson, Alex Eidukonis, Stan Todorov, Dennis Rodier, Frank Sinclair, Thirumal Thanigaivelan
Publikováno v:
2014 20th International Conference on Ion Implantation Technology (IIT).
The continued advance of semiconductor technology, including the emergence of 3D device architectures, demands ever-increasing precision of dose and angle control in ion implantation. The Varian Semiconductor Equipment business unit of Applied Materi
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a76eb7d71c010e3defc5164cee14c2bf
https://doi.org/10.1109/iit.2014.6940037
https://doi.org/10.1109/iit.2014.6940037
Autor:
Sinclair, Frank, Olson, Joe, Rodier, Dennis, Eidukonis, Alex, Thanigaivelan, Thirumal, Todorov, Stan
Publikováno v:
2014 20th International Conference on Ion Implantation Technology (IIT); 2014, p1-4, 4p
Publikováno v:
2014 20th International Conference on Ion Implantation Technology (IIT); 2014, p1-5, 5p