Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Alessandra Navarra"'
Autor:
Karsten Gutjahr, Amir Widmann, Christian Sparka, Michael Kubis, Alessandra Navarra, Anat Marchelli, Mark Ghinovker
Publikováno v:
Metrology, Inspection, and Process Control for Microlithography XXIII.
As the overlay performance and accuracy requirements become tighter, the impact of process parameters on the target signal becomes more significant. Traditionally, in order to choose the optimum overlay target, several candidates are placed in the ke
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::e41660ea68b436b35988ea44f4e5cbc2
https://doi.org/10.1117/12.813594
https://doi.org/10.1117/12.813594
Autor:
Berta Dinu, Uwe Kramer, Amir Widmann, Michael Kubis, Anat Marchelli, Christian Sparka, Stefan Fuchs, Alessandra Navarra
Publikováno v:
SPIE Proceedings.
The newly emerging lithographic technologies related to the 32nm node and below will require a step function in the overlay metrology performance, due to the dramatic shrinking of the error budgets. In this work, we present results of an emerging alt
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::659295e5559c900dcaa0eb8f87e6b385
https://doi.org/10.1117/12.771581
https://doi.org/10.1117/12.771581
Autor:
Jan Kaiser, Elad Sommer, Igal Ben-Dayan, Frank Voss, Goeran Fleischer, Dirk Schöne, Galit Zuckerman, Amir Len, Uwe Kramer, Roman Kris, Alessandra Navarra, Stefano Ventola, Shalev Dror
Publikováno v:
SPIE Proceedings.
CD-SEMs fleet matching is a widely discussed subject and various approaches and procedures to determine it were described in the literature [1,2,4-6]. The different approaches for matching are all based on statistical treatment of CD measurements tha
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::0a55bcc893a4d72953e045fb33a6a213
https://doi.org/10.1117/12.776865
https://doi.org/10.1117/12.776865