Zobrazeno 1 - 10
of 11
pro vyhledávání: '"Aleksandr Yu. Vinokhodov"'
Autor:
Aleksandr Yu. Vinokhodov, Valentin A Mishchenko, Vladimir M. Borisov, Yurii B Kiryukhin, Galina N Borisova, Aleksandr S Ivanov, Aleksandr V Prokof'ev, O B Khristoforov, S V Zakharov
Publikováno v:
Quantum Electronics. 40:720-726
Characteristics of a discharge-produced plasma (DPP) light source in the spectral band 13.5±0.135 nm, developed for Extreme Ultra Violet (EUV) lithography, are presented. EUV light is generated by DPP in tin vapour formed between rotating disk elect
Autor:
Vladimir M. Borisov, Uwe Stamm, Kai Dr. Gäbel, M. Darscht, O B Khristoforov, Guido Schriever, Aleksandr Yu. Vinokhodov
Publikováno v:
Microelectronic Engineering. :83-88
Recent results from the efforts of XTREME technologies in the development of high power EUV sources are presented in this paper. The third generation of a Z-pinch device is characterized in detail and demonstrates an EUV output power up to 7 W in-ban
Autor:
O B Khristoforov, Alexander S. Ivanov, A. Eltzov, Andrei I. Demin, Valentin A. Mischenko, Yuriy B. Kirykhin, Aleksandr Yu. Vinokhodov, Vladimir M. Borisov, Alexander V. Prokofiev, V A Vodchits
Publikováno v:
SPIE Proceedings.
We report on the experimental status of the development of compact high power (up to 500 W) high repetition rate (up to 6 kHz) excimer lasers and discharge produced plasma sources radiating in an extreme ultraviolet (EUV) region. EUV power more than
Autor:
Alexander V. Prokofiev, Yuriy B. Kiryukhin, O B Khristoforov, V A Vodchits, Andrei I. Demin, Anatoli V. Eltsov, Aleksandr Yu. Vinokhodov, Vladimir M. Borisov
Publikováno v:
International Conference on Lasers, Applications, and Technologies 2002: Advanced Lasers and Systems.
The report reviews the results of developments of the perspective excimer lasers which has been carried out in Pulsed Laser System Laboratory at TRINITI. We present parameters of XeCl laser (λ=308 nm) with average power up to 500 W and ArF laser (λ
Autor:
O B Khristoforov, Alexander S. Ivanov, Guido Schriever, Vladimir M. Borisov, Juergen Kleinschmidt, Jens Ringling, Vladimir Korobotchko, Frank Flohrer, Uwe Stamm, Sven Goetze, Aleksandr Yu. Vinokhodov, Peter Koehler, Kai Gaebel, Imtiaz Ahmad, Diethard Kloepfel
Publikováno v:
Emerging Lithographic Technologies VI.
Next generation semiconductor chip manufacturing using extreme ultraviolet (EUV) lithography requires a brilliant radiation source with output power between 50 W and 120 W in intermediate focus. This is about five to ten times higher power than that
Autor:
Vladimir M. Borisov, Uwe Stamm, Vladimir Korobotchko, Sven Goetze, Imtiaz Ahmad, Juergen Kleinschmidt, Aleksandr Yu. Vinokhodov, Jens Ringling, O B Khristoforov, Alexander S. Ivanov, Guido Schriever
Publikováno v:
Emerging Lithographic Technologies VI.
We report on the experimental status of the development of gas discharge produced plasma EUV sources for lithography based on the Z-pinch concept. The plasma size of approximately 1.3 mm X 1.5 mm has been matched to come close to the requirements res
Autor:
Uwe Stamm, Dirk Basting, O B Khristoforov, Guido Schriever, Manfred Rahe, Vladimir M. Borisov, Aleksandr Yu. Vinokhodov
Publikováno v:
SPIE Proceedings.
According to Sematech International's analysis extreme ultraviolet (EUV) photolithography is one of the most promising approaches for next generation lithography (NGL). The insertion point of NGL is likely at the 50 nm node. To establish EUV lithogra
Autor:
O B Khristoforov, V A Vodchits, Yurii B. Kirykhin, Andrei I. Demin, A. Eltzov, Aleksandr Yu. Vinokhodov, Vladimir M. Borisov
Publikováno v:
SPIE Proceedings.
Recent progress in excirner laser technology developed at TRINITI is reported. The key of the technologT is a combination of simple reliable UV preionizer based on creeping discharge on surface of a sapphire plate and the compact highly efficient gas
Autor:
Uwe Stamm, Vladimir M. Borisov, Dirk Basting, V A Vodchits, O B Khristoforov, Yurii B. Kirykhin, Frank Voss, Aleksandr Yu. Vinokhodov, Andrei I. Demin, Igor Bragin
Publikováno v:
SPIE Proceedings.
A review of recent achievements and new tendencies in the development high energy, high repetition rate excimer lasers will be presented. The paper mainly focuses on the features of KrF, XeCl lasers with different combinations of output energy x puls
Autor:
S G Kuznetsov, Yurii B. Kirykhin, O B Khristoforov, Yu Yu Stepanov, Aleksandr Yu. Vinokhodov, Vladimir M. Borisov
Publikováno v:
SPIE Proceedings.
High-power operation of excimer lasers was investigated using UV-preionization schemes based on a dielectric surface creeping discharge. The design and operation of the high average power excimer laser systems are described. A large-aperture (10 X 7