Zobrazeno 1 - 10
of 280
pro vyhledávání: '"Aleksander Jablonski"'
Publikováno v:
Surface and Interface Analysis.
Autor:
Aleksander Jablonski
Publikováno v:
Surface Science. 688:14-24
The attenuation length approach for determination of an overlayer thickness is analyzed in the case of overlayer/substrate systems in which both materials distinctly differ; in particular, they exhibit considerably different electron transport proper
Autor:
Cedric J. Powell, Aleksander Jablonski
Publikováno v:
Journal of Electron Spectroscopy and Related Phenomena. 236:27-32
We analyzed the experiments of Rubio-Zuazo and Castro [J. Electron Spectrosc. Relat. Phenom. 184 (2011) 384] who reported measurements of effective attenuation lengths (EALs) of gold for electron energies between 1 keV and 15 keV. They deposited thin
Autor:
Aleksander Jablonski
Publikováno v:
Journal of Electron Spectroscopy and Related Phenomena. 234:34-46
A very simple method for determining the photoelectron partial intensities and reduced partial intensities for HAXPES photoelectrons is proposed. For these calculations, it is sufficient to know a formalism expressing the photoelectron signal intensi
Autor:
Aleksander Jablonski
Publikováno v:
Computer Physics Communications. 235:489-501
The objective of this study was to design an algorithm for calculating the Chandrasekhar function ( H -function) dedicated for theoretical models of photoelectron transport in condensed matter. It has been shown that only the H -function values for n
Publikováno v:
Materials
Mo disulfide overlayers with the thickness exceeding 1.77 nm were obtained on Si substrates through mechanical exfoliation. The resulting Mo disulfide flakes were then analyzed ex situ using combination of Auger electron spectroscopy (AES), elastic-p
Autor:
Aleksander Jablonski
Publikováno v:
Computer Physics Communications. 272:108233
Quantitative analysis by X-ray photoelectron spectroscopy (XPS) requires knowledge of a theoretical model relating different features of recorded spectra with needed characteristics of a studied sample. An advanced theoretical approach describing an
Publikováno v:
Applied Surface Science. 437:347-356
The step-by-step growth of yttrium oxide layer was controlled in situ using X-ray photoelectron spectroscopy (XPS). The O/Y atomic concentration (AC) ratio in the surface layer of finally oxidized Y substrate was found to be equal to 1.48. The as-gro
Autor:
Aleksander Jablonski
Publikováno v:
Surface Science. 667:121-137
Growing availability of synchrotron facilities stimulates an interest in quantitative applications of hard X-ray photoemission spectroscopy (HAXPES) using linearly polarized radiation. An advantage of this approach is the possibility of continuous va
Autor:
Aleksander Jablonski
Publikováno v:
Journal of Surface Analysis. 24:115-122