Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Aleks Simic"'
Publikováno v:
Optical Microlithography XXXI.
DUV ArF immersion lithography requires patterning budget improvements in the range of 1/10 nm especially for interconnect layers for advanced process nodes. As every angstrom counts, the Cymer XLR 860ix light source has been developed to deliver the
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::83a51d6be0b503576a66d6e1fd8bcbc5
https://doi.org/10.1117/12.2298431
https://doi.org/10.1117/12.2298431
Autor:
Joshua Thornes, Aleks Simic, Ronnie P. Flores, Brian Wehrung, David Dunlap, Matt Lake, Will Conley, John Wyman, Hoang Dao, Kevin M. O'brien
Publikováno v:
SPIE Proceedings.
As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::ec301d83720be6bb551a7115ff4a92a6
https://doi.org/10.1117/12.2086102
https://doi.org/10.1117/12.2086102
Autor:
Brian Wehrung, John Wyman, Ronnie P. Flores, Matt Lake, Will Conley, Josh Thornes, Alicia Russin, Hoang Dao, Aleks Simic, David Dunlap, Kevin Michael O'brien
Publikováno v:
SPIE Proceedings.
As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost o
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::f0075924ac6f0e0a1f0b691cab6fc059
https://doi.org/10.1117/12.2048305
https://doi.org/10.1117/12.2048305