Zobrazeno 1 - 3
of 3
pro vyhledávání: '"Albert Rogers Ellingboe"'
Publikováno v:
Micromachines, Vol 13, Iss 2, p 173 (2022)
Low-hydrogen-containing amorphous silicon (a-Si) was deposited at a low temperature of 80 °C using a very high frequency (VHF at 162 MHz) plasma system with multi-split electrodes. Using the 162 MHz VHF plasma system, a high deposition rate of a-Si
Externí odkaz:
https://doaj.org/article/eb2af53d640f4771ad90744898c08a2e
Autor:
Ki Seok, Kim, You-Jin, Ji, Ki-Hyun, Kim, Ji-Eun, Kang, Albert Rogers, Ellingboe, Geun Young, Yeom
Publikováno v:
Micromachines. 13(2)
Low-hydrogen-containing amorphous silicon (a-Si) was deposited at a low temperature of 80 °C using a very high frequency (VHF at 162 MHz) plasma system with multi-split electrodes. Using the 162 MHz VHF plasma system, a high deposition rate of a-Si
Autor:
Ki Seok Kim, Nishant Sirse, Ki Hyun Kim, Albert Rogers Ellingboe, Kyong Nam Kim, Geun Young Yeom
Publikováno v:
Journal of Physics D: Applied Physics; 10/5/2016, Vol. 49 Issue 39, p1-1, 1p