Zobrazeno 1 - 10
of 19
pro vyhledávání: '"Alan Michael Hynes"'
Publikováno v:
International Journal of Adhesion and Adhesives. 35:1-8
An atmospheric pressure plasma system has been used to treat amorphous polyethylene terephthalate (APET) to enhance its heatseal properties to a polyethylene terephthalate (PET) film. The plasma treated APET sheet material was thermoformed into trays
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::787167c621ff45123f4400674d18178d
https://doi.org/10.1016/j.ijadhadh.2012.01.025
https://doi.org/10.1016/j.ijadhadh.2012.01.025
Publikováno v:
Journal of Materials Processing Technology. 211:1210-1216
In this study rapid discharge sintering (RDS) and furnace sintering of nickel–diamond metal matrix composites (MMCs) is compared. Nickel–diamond powder composites (80–20% by weight respectively) were uniaxially pressed into 20 mm discs at compa
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::2f030f4da47a4ab1343acc589e6f87b7
https://doi.org/10.1016/j.jmatprotec.2011.02.002
https://doi.org/10.1016/j.jmatprotec.2011.02.002
Publikováno v:
Metal Powder Report. 65:10-13
A group of Irish researchers have demonstrated that rapid discharge sintering can dramatically reduce sintering times for processing small numbers of green compacts. But while mainstream sintering technologies have the upper hand for the time being,
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::560d2978d13a31b613ca563bd2ff0509
https://doi.org/10.1016/s0026-0657(10)70089-8
https://doi.org/10.1016/s0026-0657(10)70089-8
Autor:
Denis P. Dowling, Lucas Schaper, Gerry Byrne, Liam O'neill, Alan Michael Hynes, D. Della Croce, Barry Twomey, William Graham
Publikováno v:
IEEE Transactions on Plasma Science. 37:961-969
A large-scale atmospheric pressure plasma has been generated in helium, and the time-resolved optical and electrical properties have been shown to produce a homogeneous dielectric barrier discharge. Introducing tetraethyl orthosilicate as a liquid ae
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::7b12945f045705a04fd8ec219cdbb675
https://doi.org/10.1109/tps.2009.2015226
https://doi.org/10.1109/tps.2009.2015226
Publikováno v:
Surface and Coatings Technology. 203:2021-2029
This study evaluated the use of pin-on-disc wear testing as a technique to examine the mechanical behaviour of nanometre thick plasma deposited coatings. The coatings were deposited onto polyethylene terephthalate and silicon wafer substrates by dire
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::1f6f24b39faa3204a9fbe401ee62ab1f
https://doi.org/10.1016/j.surfcoat.2009.01.042
https://doi.org/10.1016/j.surfcoat.2009.01.042
Autor:
Alan Michael Hynes, Lesley-Ann O'Hare, Liam O'neill, Gerry Byrne, Mahfujur Rahman, Denis P. Dowling, Barry Twomey
Publikováno v:
Plasma Processes and Polymers. 5:737-744
This study reports on the effect on the morphology and chemistry of atmospheric pressure plasma deposited nm-thick coatings (21 � 3 nm) as the level of exposure to the plasma is systematically altered. Coatings were deposited by directly injecting
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::5f65cffcbccd529f4acdb09a58c53f03
https://doi.org/10.1002/ppap.200800048
https://doi.org/10.1002/ppap.200800048
Publikováno v:
Surface and Interface Analysis. 39:926-936
Plasma-enhanced coating processes are recognised as a route to well-adhered, conformal coatings, and are often used as a means of modifying the surface properties of materials, while having a minimal effect on the bulk characteristics of the substrat
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::56c3ce98015882e2a9e2ddc45900af48
https://doi.org/10.1002/sia.2634
https://doi.org/10.1002/sia.2634
Autor:
I. Johnston, J. N. Shepherd, Huma Ashraf, Jyoti Kiron Bhardwaj, Alan Michael Hynes, Janet Hopkins
Publikováno v:
Sensors and Actuators A: Physical. 74:13-17
In the ongoing enhancement of MEMS applications, the STS Advanced Silicon Etch, ASE™, process satisfies the demanding requirements of the industry. Typically, highly anisotropic, high aspect ratios profiles with fine CD control are required. Select
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::660d07709aa5a0dde9ff8ca7ddfed8a0
https://doi.org/10.1016/s0924-4247(98)00326-4
https://doi.org/10.1016/s0924-4247(98)00326-4
Publikováno v:
Chemistry of Materials. 10:2177-2182
Pulsed plasma polymerization of perfluoroallylbenzene can lead to the deposition of films containing high concentrations of perfluorinated phenyl groups. X-ray photoelectron spectroscopy, Fourier transform infrared spectroscopy, and deposition rate m
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::652b860ef0ac763c25f7c4ccd811d7b5
https://doi.org/10.1021/cm9800682
https://doi.org/10.1021/cm9800682
Publikováno v:
Polyhedron. 15:391-402
The reaction of GaR3 ( R = t Bu, Me ) with 1, 2, or 3 molar equivalents of 2-mercaptopyridine (HSpy) yielded Ga(R)2(Spy) [ R = t Bu ( 1 ), Me ( 2 ) ], Ga(R)(Spy)2 [ R = t Bu ( 3 ), Me ( 4 ) ], and Ga(Spy)3, (5), respectively. Reaction of GaCl3 and HS
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::6c83fe1fb4cc5d4ea448e6947a2570f0
https://doi.org/10.1016/0277-5387(95)00253-o
https://doi.org/10.1016/0277-5387(95)00253-o