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pro vyhledávání: '"Alan D. Nolet"'
Publikováno v:
MRS Proceedings. 131
Chemical Vapor Deposition (CVD) of thin films for microelectronic devices has historically used source materials that are gases at room temperature [1]. The decision to use gases was largely a practical one based on the relative ease with which the f
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::798acee7d556829df9436a3132d55055
https://doi.org/10.1557/proc-131-319
https://doi.org/10.1557/proc-131-319
