Zobrazeno 1 - 10
of 95
pro vyhledávání: '"Alain Moussa"'
Autor:
Cong Chen, Dieter Van Den Heuvel, Matteo Beggiato, Bensu Tunca Altintas, Alain Moussa, Anne Vandooren, Bart Baudemprez, Michael Schöbitz, Wassim Khaldi, Janusz Bogdanowicz, Christophe Beral, Anne-Laure Charley
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Gian Francesco Lorusso, Dieter Van Den Heuvel, Mohamed Zidan, Alain Moussa, Christophe Beral, Anne-Laure Charley, Danilo De Simone, Anuja De Silva, Elisseos Verveniotis, Ali Haider, Tsuyoshi Kondo, hiroyuki shindo, yasushi ebizuka, miki isawa
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Alain Moussa, Janusz Bogdanowicz, Benjamin Groven, Pierre Morin, Matteo Beggiato, Mohamed Saib, Gaetano Santoro, Yaniv Abramovitz, Kevin Houtchens, Shmuel Ben Nissim, Noga Meir, Joey Hung, Adam M. Urbanowicz, Roy Koret, Igor Turovets, Gian Francesco Lorusso, Anne-Laure Charley
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Victor M. Blanco Carballo, Eren Canga, Christiane Jehoul, Alain Moussa, Amir-Hossein Tamaddon, Cyrus Tabery, Gautam Gunjala, Boris Menchtchikov, Gabriel Zacca, Sanjay Lalbahadoersing, Arie den Boef, Ron Synowicki
Publikováno v:
Metrology, Inspection, and Process Control XXXVII.
Autor:
Mohamed Zidan, Daniel Fischer, Joren Severi, Danilo De Simone, Alain Moussa, Angelika Müllender, Chris Mack, Anne-Laure Charley, Philippe Leray, Stefan De Gendt, Gian Francesco Lorusso
Publikováno v:
Journal of Micro/Nanopatterning, Materials, and Metrology. 22
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Mohamed Zidan, Daniel Fischer, Gian F. Lorusso, Joren Severi, Danilo De Simone, Alain Moussa, Angelika Muellender, Chris A. Mack, Anne-Laure Charley, Philippe Leray, Stefan De Gendt
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Irene Battisti, Kevin M. Makles, Marta S. Mucientes, Yan Guo, Erik Simons, Janusz Bogdanowicz, Alain Moussa, Victor Blanco, Farrukh Yasin, Davide Crotti, Anne-Laure Charley, Philippe Leray, Maarten E. van Reijzen, Cornel Bozdog, Hamed M. Sadeghian
Publikováno v:
Metrology, Inspection, and Process Control XXXVI.
Autor:
Gian Francesco Lorusso, Danilo De Simone, Mohamed Zidan, Joren Severi, Alain Moussa, Bappaditya Dey, Sandip Halder, Alex Goldenshtein, Kevin Houchens, Gaetano Santoro, Daniel Fischer, Angelika Muellender, Chris Mack, Tsuyoshi Kondo, Tomoyasu Shohjoh, Masami Ikota, Anne-Laure Charley, Stefan De Gendt, Philippe Leray
Publikováno v:
Japanese Journal of Applied Physics. 62:SG0808
One of the many constraints of high numerical aperture extreme ultraviolet lithography is related to resist thickness. A critical consequence of moving from the current 0.33 to 0.55 NA (high NA) is depth of focus reduction. The question we seek to an
Autor:
Joren Severi, Gian F. Lorusso, Danilo De Simone, Alain Moussa, Mohamed Saib, Rutger Duflou, Stefan De Gendt
ispartof: JOURNAL OF MICRO-NANOPATTERNING MATERIALS AND METROLOGY-JM3 vol:21 issue:2 status: published
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_dedup___::b898bb420732faa604c0c9a3c53567d4
https://lirias.kuleuven.be/handle/20.500.12942/708690
https://lirias.kuleuven.be/handle/20.500.12942/708690