Výsledky vyhledávání - "Akiyoshi Mitsumori"

Reliability tests of electroless barriers against copper diffusion under bias-temperature stress with n- and p-type substrates

Autor: Makoto Yamashita, Shota Fujishima, Akiyoshi Mitsumori, Kazuyoshi Ueno

Publikováno v: Japanese Journal of Applied Physics. 55:056501

To investigate the similarity and difference of substrate conduction type in the time-dependent dielectric breakdown (TDDB) tests for the barrier integrity against Cu diffusion under bias-temperature stress (BTS), the TDDB reliability of electroless

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_________::ac5273d689dc395a11a969857aadb818
https://doi.org/10.7567/jjap.55.056501

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Barrier Integrity of Electroless Diffusion Barriers and Organosilane Monolayer against Copper Diffusion under Bias Temperature Stress

Autor: Akiyoshi Mitsumori, Kazuyoshi Ueno, Shota Fujishima

Publikováno v: Japanese Journal of Applied Physics. 51:05EB03

Barrier integrity of electroless NiB and CoWP/NiB thin layers against copper (Cu) diffusion was evaluated by time-dependent dielectric breakdown (TDDB) under bias temperature stress (BTS) using metal oxide semiconductor (MOS) test structures. The BTS

Externí odkaz: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::0145a1679746798ded5e58011593c878
https://doi.org/10.1143/jjap.51.05eb03

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Akademický článek

Reliability tests of electroless barriers against copper diffusion under bias-temperature stress with n- and p-type substrates.

Autor: Kazuyoshi Ueno, Shota Fujishima, Makoto Yamashita, Akiyoshi Mitsumori

Publikováno v: Japanese Journal of Applied Physics; May2016, Vol. 55 Issue 5, p1-1, 1p

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