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Autor:
Mitsukuni Tsukihara, Kazuhisa Ishibashi, Shiro Ninomiya, Toshio Yumiyama, Kazuyoshi Ueno, Akihiro Ochi, Mitsuaki Kabasawa, Akira Funai
Publikováno v:
2016 21st International Conference on Ion Implantation Technology (IIT).
Two-dimensional (2D) dose control is becoming well accepted for semiconductor device fabrication. At the same time, two specialized versions are arising; (1) High accuracy intentional non-uniform dose implant with relatively moderate dynamic dose ran
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::d1b5b1b24100c757633230a43862a942
https://doi.org/10.1109/iit.2016.7882883
https://doi.org/10.1109/iit.2016.7882883
