Zobrazeno 1 - 10
of 16
pro vyhledávání: '"Akinori Ohkubo"'
Publikováno v:
Optical Manufacturing and Testing XIV.
Publikováno v:
Laser Beam Shaping XXI.
The laser stealth dicing system is a unique wafer processing system to enable high-throughput and debris-free wafer dicing. In the laser stealth dicing system, a focused pulsed laser forms a modification layer and cracks inside a silicon wafer. Durin
Autor:
Boris I. Afinogenov, Seulgi Lee, Lee Sang-Min, Sangwoo Bae, Nikita R. Filatov, Anton N. Sofronov, Minhwan Seo, Maxim Ryabko, Anton Medvedev, Vladimir O. Bessonov, Jeang Eun-Hee, Taehyun Kim, Aleksander S. Shorokhov, I. M. Antropov, Akinori Ohkubo, Ingi Kim, Joo Won-Don
Publikováno v:
Nanoengineering: Fabrication, Properties, Optics, Thin Films, and Devices XVII.
We demonstrate the broadband visible luminescence from bulk crystalline silicon and silicon nanoparticles sized 100- 30 nm under near-infrared excitation. We show that the luminescence spectrum has two distinct peaks. The first being centered at 550
Publikováno v:
Reflection, Scattering, and Diffraction from Surfaces VII.
Advances in the semiconductor industry have led the wafer inspection technology to the limit of nanometer-scale defect detection, which is far beyond the diffraction limit. In this regime, the signal-to-noise ratio (SNR) is the figure-of-merit to det
Autor:
Seulgi Lee, I. M. Antropov, Sangwoo Bae, Akinori Ohkubo, Joo Won-Don, Aleksandr Shorokhov, Hosun Yoo, Anton Medvedev, Kyunghun Han, Taehyun Kim, Minhwan Seo, Boris I. Afinogenov, Jeang Eun-Hee, Vladimir O. Bessonov, Maksim Riabko, Lee Sang-Min, Anton N. Sofronov, Ingi Kim
Publikováno v:
Nonlinear Optics and its Applications 2020.
Detection of a single nanoparticle on a bare silicon wafer has been a challenge in the semiconductor industry for decades. Currently, the most successful and widely used technique is dark-field microscopy. However, it is not capable of detecting sing
Autor:
Jungchul Lee, Seongkeun Cho, Hyungu Kim, Seulgi Lee, Joo Won-Don, Janghwi Lee, Sangwoo Bae, Taehyun Kim, Akinori Ohkubo
Publikováno v:
Optics letters. 43(23)
We rediscover the null ellipsometry principle for an outstanding image-contrast enhancement method for darkfield imaging. Simply by adding polarizers, compensators, and a photodiode sensor to a conventional darkfield imaging system and applying the n
Publikováno v:
The Review of Laser Engineering. 29:109-114
We designed and demonstrated two new schemes to improve the performance of stimulated Brillouin scattering (SBS) cells for a high average power laser. By introducing a lamellar flow cell, thermallyinducedefocusingand convection via laser light absorp
Autor:
Tokuyuki Honda, Akinori Ohkubo, Minoru Yoshii, Miyoko Kawashima, Yuichi Iwasaki, Yasuhiro Kishikawa
Publikováno v:
SPIE Proceedings.
As the resolution of optical lithography is being pushed for 45-nm half-pitch node, there is a growing concern about the printing capability of chemically amplified resists. The chemical amplification involves photoacid diffusion that causes contrast
Autor:
Zhiqiang Liu, Takayuki Hasegawa, Masashi Okada, Mikihiko Ishii, Masahito Niibe, Jun Kawakami, Mitsuo Takeda, Masanobu Hasegawa, Akinori Ohkubo, Seima Kato, Jun Saito, Chidane Ouchi, Akiyoshi Suzuki, Katsura Otaki, Yoshiyuki Sekine, Zhu Yucong, Katsuhiko Murakami, Katsumi Sugisaki
Publikováno v:
Fringe 2005 ISBN: 3540260374
We have been developing the metrological techniques to achieve 0.1 nm accuracy for evaluating the EUV lithographic optics. To select the most suitable methods, six different methods are compared. As a result, we have concluded that the PDI, the LDI a
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::a2c9377e614eb6070e9705157aa2da6c
https://doi.org/10.1007/3-540-29303-5_35
https://doi.org/10.1007/3-540-29303-5_35
Autor:
Akiyoshi Suzuki, Yoshiyuki Sekine, Yuichi Iwasaki, Miyoko Kawashima, Akinori Ohkubo, Yasuhiro Kishikawa, Kenji Yamazoe, Tokuyuki Honda
Publikováno v:
Optical Microlithography XVIII.
As imaging properties of ArF Immersion optics are evaluated in a hyper-NA region, the polarization of illumination systems and vectorial mask diffraction play an important role. We investigate the effectiveness of polarized illumination for practical