Zobrazeno 1 - 1
of 1
pro vyhledávání: '"Akiko Hisasue"'
Publikováno v:
Microelectronic Engineering. 21:19-24
With shrinking design rules, the DOF becomes a major concern in lithographical processes. Several methods to improve the DOF are proposed already, each with its advantages and drawbacks. In this work, a new approach to increase the DOF on topographic
Externí odkaz:
https://explore.openaire.eu/search/publication?articleId=doi_________::3c4960826e15c6ee12c37bf7c928b37c
https://doi.org/10.1016/0167-9317(93)90018-z
https://doi.org/10.1016/0167-9317(93)90018-z
